Optical Waveguide Polishing Machine with Dry Ice Cleaning

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Solution Overview

Problem

Existing polishing machines for optical waveguides are inefficient in cleaning the polishing platform and disk, leading to residue and reduced quality of polished surfaces, requiring manual intervention and time-consuming processes.

Innovation Solution

A polishing machine equipped with a cleaning device using dry ice to remove pollutants and residue from the polishing platform and disk, allowing for automatic cleaning between polishing processes, enhancing the quality and efficiency of the polishing process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If manual cleaning of the polishing platform and disk is used, then the cleaning process is simple and requires minimal equipment, but the cleaning effectiveness is poor leading to residue and reduced polishing quality

Engineering Contradiction:
Improvepolishing qualityVSAvoidcleaning process complexity
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent replaces manual mechanical cleaning with an automated air jet cleaning system. Compressed air is directed through nozzles to blow away polishing residue, abrasive particles, and rinsing liquid from the polishing platform and disk, eliminating the need for manual intervention while improving cleaning effectiveness and polishing quality.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The invention utilizes pneumatic principles by employing compressed air as the cleaning medium. Air nozzles are positioned to direct high-velocity air streams across the polishing surfaces, effectively removing contaminants through aerodynamic forces without requiring physical contact or complex mechanical cleaning mechanisms.

Inventive Principle:
Principle #29Pneumatics and hydraulics

2Productivity

If manual cleaning and abrasive replacement is performed between polishing processes, then equipment complexity is low, but productivity is reduced due to time-consuming operations

Engineering Contradiction:
Improvepolishing process efficiencyVSAvoidcleaning device complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The polishing system incorporates self-service cleaning capabilities through automated air jet nozzles that continuously or periodically clean the polishing platform and disk during or between polishing operations. This eliminates the need for operator intervention to manually clean surfaces, reducing downtime and increasing overall productivity.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The air jet cleaning system performs preliminary cleaning actions before the next polishing process begins. By automatically removing residue and contaminants in advance, the system prepares the polishing surfaces for the next operation without requiring separate manual cleaning steps, thereby improving process efficiency.

Inventive Principle:
Principle #10Preliminary action

3Reliability

If rinsing liquid is used during polishing, then cooling and lubrication are improved, but residue and pollution accumulate on the polishing platform and disk

Engineering Contradiction:
Improvepolishing process stabilityVSAvoidpollution and residue
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The air jet cleaning system extracts and removes rinsing liquid residue, abrasive particles, and polishing debris from the polishing platform and disk. Compressed air streams blow the contaminants off the surfaces and away from the polishing zone, preventing accumulation and maintaining a clean working environment despite continuous use of rinsing liquid.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

Compressed air acts as an intermediary cleaning medium between the polishing process and the environment. The air stream serves as a transfer mechanism to remove harmful residues and pollutants generated during polishing with rinsing liquid, without requiring direct physical contact or additional chemical cleaners.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The use of dry ice effectively removes abrasive particles, wear debris, and rinsing liquid residue, improving the polishing quality and reducing operator time, enabling a more economical and high-quality polishing process.

Implementation Method 1

a cleaning device for applying dry ice to the polishing platform and/or to the polishing disk

Methodology Applied
Scientific EffectSublimation: Sublimation

Data Source

PatentUS11667006B2Polishing machine and method for polishing optical waveguides
Publication Date: 2023.06.06 AMPHENOL PRECISION OPTICS GMBH
  • US11667006B2 patent drawing
  • US11667006B2 patent drawing
  • US11667006B2 patent drawing

AI summary

The invention relates to a polishing machine (10) and to a method for polishing optical waveguides, the polishing machine comprising a polishing disk (13) having a plug socket (14) for holding a plug with an optical waveguide, a polishing platform (15) for receiving an abrasive, a positioning device (17) for relative positioning of the polishing disk and of the polishing platform between a polishing position and a set-up position (16), and a drive device for executing a relative polishing movement between the polishing platform and the polishing disk in the polishing position, wherein the polishing machine has a cleaning device for applying dry ice to the polishing platform and/or to the polishing disk.