Circumferential Waveguide Resonator for Uniform Plasma Density
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in achieving uniform plasma density distribution in the circumferential direction within the processing container.
Innovation Solution
The apparatus incorporates a waveguide device with a resonator that supplies high-frequency waves through a waveguide extending in the circumferential direction, connected to an inlet, ensuring uniform power distribution and improving plasma density uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional plasma processing apparatus is used, then plasma can be generated for processing, but the plasma density distribution in the circumferential direction is non-uniform
Solution Approach 1:
The waveguide is divided into multiple sections extending in the circumferential direction, with each section independently connected to the processing chamber. This segmentation allows each waveguide section to deliver high-frequency power to a specific circumferential region, enabling uniform plasma density distribution across the entire chamber while maintaining a manageable structural complexity through modular design
Solution Approach 2:
The waveguide structure is designed with varying characteristics along its circumferential length to match the local plasma generation requirements. Each section of the waveguide is optimized for its specific position, creating locally adapted plasma density that collectively achieves uniform overall distribution without requiring excessive structural complexity
2Productivity
If high-frequency waves are supplied to generate plasma, then plasma processing can be performed, but the plasma density distribution becomes non-uniform in the circumferential direction
Solution Approach 1:
The plasma generation process is segmented into multiple independent high-frequency wave supply channels through the circumferentially extended waveguide. Each channel can be independently controlled to maintain optimal plasma density in its respective region, ensuring both high processing efficiency and uniform plasma distribution across the substrate
Solution Approach 2:
The waveguide structure enables periodic delivery of high-frequency power around the circumferential direction, creating a patterned plasma generation that can be optimized for uniformity. The periodic structure of the waveguide allows systematic control of plasma density distribution while maintaining continuous processing efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration results in a uniform plasma density distribution in the circumferential direction, enhancing the uniformity of plasma processing on substrates.
Implementation Method 1
The waveguide device is configured to supply high-frequency waves to the inlet. The waveguide device includes a resonator that provides a waveguide. The waveguide of the resonator extends in the circumferential direction around the central axis and extends in the direction in which the central axis extends to be connected to the inlet.
Implementation Method 2
The waveguide device includes a resonator that provides a waveguide.
Implementation Method 3
an electric field is supplied from the waveguide to the cavity resonator in order to generate plasma
Implementation Method 4
an electric field is supplied from the waveguide to the cavity resonator in order to generate plasma
Data Source
AI summary
In an example of an embodiment, a plasma processing apparatus includes a processing container, a stage, an upper electrode, an inlet, and a waveguide device. The stage is provided within the processing container. The upper electrode is provided above the stage, to interpose a space within the processing container. The inlet is configured to introduce high-frequency waves. The high-frequency waves are VHF waves or UHF waves. The inlet is provided at an end of the space in the lateral direction, and extends in a circumferential direction around a central axis of the processing container. The waveguide device is configured to supply high-frequency waves to the inlet. The waveguide device includes a resonator that provides a waveguide. The waveguide of the resonator extends in the circumferential direction around the central axis and extends in the direction in which the central axis extends to be connected to the inlet.