Wave-guiding Structure with Sacrificial Organic Layer
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Solution Overview
Problem
Conventional methods for fabricating wave-guiding structures often damage substrates during the etching process due to difficulty in controlling etching conditions.
Innovation Solution
A two-step fabrication method involving the formation of metal grids on a substrate, with a first organic layer acting as a buffer and a second organic layer forming the wave-guiding element, using haloalkyl gas or oxygen for etching to prevent substrate damage, and optionally removing the first organic layer by solvent soaking or further etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional etching process is performed on the guiding film until the substrate is exposed, then the guiding film can be completely removed, but the substrate often suffers from damage during the etching process
Solution Approach 1:
The patent introduces a sacrificial organic layer as an intermediary between the guiding film and the substrate. This sacrificial layer absorbs the etching process, preventing direct contact between the etching chemicals and the substrate, thereby eliminating substrate damage while enabling complete removal of the guiding film.
Solution Approach 2:
The sacrificial organic layer is formed on the substrate before the guiding film is deposited. This preliminary action creates a protective barrier in advance, ensuring that when the etching process occurs later, the substrate is already protected and cannot be damaged.
2Ease of manufacture
If a single-layer organic structure is used for wave-guiding, then the fabrication process is simpler, but the optical performance and light confinement are insufficient
Solution Approach 1:
The patent divides the organic wave-guiding structure into two separate layers: a lower organic layer with higher refractive index and an upper organic layer with lower refractive index. This segmentation creates a more effective wave-guiding structure with better light confinement, while the overall fabrication process remains relatively simple using standard coating and etching techniques.
Solution Approach 2:
The patent uses a composite organic structure combining two different organic materials with different refractive indices. This composite approach enables superior optical performance and light confinement compared to a single-layer structure, while maintaining compatibility with conventional fabrication processes.
3Manufacturing precision
If the organic layers are completely removed after forming the wave-guiding structure, then no residue remains on the substrate, but additional cleaning steps and time are required
Solution Approach 1:
The sacrificial organic layer is designed as a temporary, disposable element that serves its protective function during fabrication and is then completely removed. This approach ensures no residue remains on the substrate, eliminating the need for additional cleaning steps and reducing overall processing time.
Solution Approach 2:
The sacrificial organic layer is intentionally discarded after serving its protective purpose. Its complete removal leaves the substrate clean without requiring further cleaning operations, as the sacrificial layer was designed to be temporarily present and then eliminated.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively prevents substrate damage during etching and maintains optical performance comparable to conventional wave-guiding structures without a microlens, ensuring the integrity of the wave-guiding element.
Implementation Method 1
A second organic layer and the first organic layer are etched to leave the plurality of metal grids and a plurality of patterned second organic layers formed on the plurality of metal grids
Implementation Method 2
the second organic layer is etched by a first etching process which uses haloalkyl gas as an etching gas
Implementation Method 3
the first organic layer is etched by a second etching process which uses oxygen, carbon dioxide or nitrogen as an etching gas
Implementation Method 4
The first organic layer has a refractive index which is in a range from about 1.4 to about 1.55. The second organic layer has a refractive index which is in a range from about 1.2 to about 1.45
Data Source
AI summary
An optical element is provided. The optical element includes a substrate; a plurality of metal grids formed on the substrate; an oxide layer formed on the substrate between the plurality of metal grids; and a plurality of organic layers formed on the plurality of metal grids, wherein the width of the organic layer is greater than the width of the metal grid, and there is at least one gap between the organic layer and the oxide layer.