Weak-Acid Developing Fluid Heating for Metal Resist Uniformity
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Solution Overview
Problem
Existing substrate treatment systems face challenges in effectively developing metal-containing resist films on substrates post-exposure, particularly in efficiently supplying and heating developing fluids to ensure proper film development.
Innovation Solution
A developing fluid supply apparatus comprising a supply path, a developing fluid generator, and a heating part to deliver and heat a developing fluid containing gas or mist of a weak acid, specifically using a vaporizer to generate the fluid and a hot plate to regulate temperature for optimal film development.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a developing fluid is supplied to develop metal-containing resist films, then the film development effectiveness is improved, but the temperature control precision and uniformity deteriorate
Solution Approach 1:
The developing fluid supply system is segmented into multiple independent nozzles that can be controlled separately. Each nozzle can supply developing fluid to different regions of the substrate, allowing localized temperature and flow control. This segmentation enables precise temperature management while maintaining effective film development across the entire substrate surface.
Solution Approach 2:
The system implements local quality control by varying the developing fluid supply characteristics (temperature, flow rate, timing) for different regions of the substrate. The heating portions can be independently controlled to provide optimal local temperature conditions, ensuring precise temperature control while maintaining effective development across areas with different thermal requirements.
2Productivity
If developing fluid is supplied at high temperature to improve development speed, then the productivity is improved, but the temperature uniformity across the substrate deteriorates
Solution Approach 1:
The developing fluid supply operates in periodic cycles with multiple stages: initial high-temperature fluid supply for rapid development, followed by controlled cooling phases. The nozzles can be activated in sequences, with different nozzles operating at different times and temperatures. This periodic action maintains high development speed while preventing thermal accumulation that would cause temperature non-uniformity.
Solution Approach 2:
The system dynamically adjusts the temperature and flow rate of the developing fluid supplied to different regions based on real-time processing conditions. The heating portions can be independently controlled to maintain optimal temperature gradients, enabling fast development while preserving temperature uniformity across the substrate through adaptive control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances the development process by ensuring precise temperature control and uniform distribution of developing fluids, improving the efficiency and effectiveness of metal-containing resist film development on substrates.
Implementation Method 1
a developing fluid generator configured to generate the developing fluid from a developing liquid
Implementation Method 2
a heating part configured to heat the developing fluid to be supplied to the developing part
Data Source
AI summary
A developing fluid supply apparatus comprises a supply path connected to a developing part configured to develop a substrate on which a metal-containing resist film has been formed and which has been subjected to exposure processing, with a developing fluid containing at least one of gas and mist of a weak acid, a developing fluid generator configured to generate the developing fluid from a developing liquid; and a heating part configured to heat the developing fluid to be supplied to the developing part via the supply path.