Weather-Resistant Polishing Pad Using Benzene-Free Polyurethane
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Solution Overview
Problem
Conventional polishing pads suffer from poor weather resistance, discoloration, and breakdown due to sunlight exposure, leading to adverse effects on their working characteristics and appearance.
Innovation Solution
A weather-resistant polishing pad is developed, comprising an upper layer made of a polyurethane prepolymer derived from polyol and polyfunctional isocyanate without a benzene ring, or with an indirectly connected benzene ring, combined with a buffer layer and transparent base using a pressure-sensitive adhesive, which enhances stability and resistance to ultraviolet radiation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional polishing pad materials are used, then the polishing pad can be manufactured with standard materials and processes, but the polishing pad discolors and breaks down due to sunlight and ultraviolet light exposure
Solution Approach 1:
The patent changes the chemical composition parameters of the polishing pad by using specific polyurethane prepolymers with controlled molecular weight (1000-35000 mPa·S viscosity) and isocyanate content, along with specific curing agents and functional fillers in defined ratios, to achieve weather resistance while maintaining polishing performance
Solution Approach 2:
The patent creates a composite material system combining polyurethane prepolymer, curing agent, and functional filler in specific proportions (mass ratio 100:2.5-41:0.15-5) to produce a polishing layer that resists weathering, discoloration, and breakdown from sunlight and ultraviolet exposure
2Stability of the object's composition
If the polyurethane prepolymer viscosity is increased to improve material stability, then the material becomes more stable, but the manufacturing process becomes more difficult
Solution Approach 1:
The patent optimizes the viscosity parameter of polyurethane prepolymer to a specific range (1000-35000 mPa·S) that balances material stability with ease of processing and application, allowing the mixture to remain workable while achieving the desired stable composition in the final product
3Duration of action of moving object
If the polishing pad layer is made thicker to improve durability, then the service life is extended, but the polishing efficiency decreases
Solution Approach 1:
The patent uses a composite formulation with functional fillers and optimized polymer ratios to achieve high durability in a thinner layer, maintaining polishing efficiency while extending service life through improved material composition rather than increased thickness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides a polishing pad with improved weather resistance, stability, and prolonged service life, preventing color change and breakdown, while maintaining high intensity and production efficiency.
Implementation Method 1
The polyurethane prepolymer is a polymerization product of polyol and polyfunctional isocyanate
Implementation Method 2
The upper layer, the buffer layer, and the transparent base are bonded via a pressure sensitive adhesive or an adhesive agent
Data Source
AI summary
A weather-resistant polishing pad, including an upper layer operating for polishing, a buffer layer, and a transparent base. The buffer layer is disposed between the upper layer and the transparent base, and the upper layer, the buffer layer, and the transparent base are bonded via a pressure sensitive adhesive or an adhesive agent. The upper layer includes a weather-resistant polyurethane prepolymer, a curing agent, and a functional filler. The polyurethane prepolymer is a polymerization product of polyol and polyfunctional isocyanate. The polyfunctional isocyanate includes a first isocyanate containing no benzene ring, or the first isocyanate having an isocyanato group and a benzene group, and the isocyanato group and the benzene group are connected indirectly.