Inclined Wet Etching Tank Filtration for Glass Debris Removal
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Solution Overview
Problem
Wet etching systems in semiconductor manufacturing face inefficiencies due to the accumulation of glass plugs and debris in the process tank, which degrade etching efficiency and tank lifespan, necessitating periodic maintenance to remove these residues.
Innovation Solution
The implementation of an inclined tank floor with a drain port at its lowest point and outlet ports higher than the drain, coupled with a debris-removal system and recirculation system, effectively separates and removes debris from the etchant, maintaining etching consistency and tank efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If glass substrates are subjected to wet etching process after laser etching, then laser residue is removed and via sidewalls are smoothed, but glass plugs accumulate in the process tank degrading etching efficiency and tank lifespan
Solution Approach 1:
The patent extracts and removes glass plugs and debris from the etching solution using a filtration system with filters positioned at the bottom of the process tank. The filters capture solid particles while allowing the etchant to circulate continuously, preventing accumulation that would otherwise degrade etching efficiency and tank lifespan.
Solution Approach 2:
The patent implements continuous circulation of the etchant solution through pumps and filtration systems that operate throughout the etching process. This continuous action prevents debris accumulation and maintains consistent etching performance without requiring periodic shutdowns for maintenance.
2Reliability
If glass plugs accumulate in the process tank, then periodic preventive maintenance is required, but this interrupts production and reduces productivity
Solution Approach 1:
The patent implements continuous circulation and filtration of the etchant solution, allowing the system to maintain tank performance without interruption. The automated filtration system operates continuously during production, eliminating the need for periodic shutdowns for preventive maintenance and maximizing manufacturing throughput.
Solution Approach 2:
The patent employs self-cleaning mechanisms where the etchant solution continuously circulates through filters that automatically capture and remove glass plugs. The system serves itself by maintaining its own performance through automated debris removal without requiring external intervention or shutdowns for maintenance.
3Manufacturing precision
If traditional flat tank floor is used, then debris settles at the bottom, but this creates clogging and reduces etching consistency
Solution Approach 1:
The patent employs a sloped tank floor design that curves toward the bottom, preventing flat surfaces where debris could settle and accumulate. The curved geometry facilitates continuous flow of etchant solution across the entire tank bottom, ensuring consistent etching performance and preventing clogging by directing all debris toward the filtration system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures consistent etching quality by promptly removing debris, preventing clogging, and extending the process tank's lifespan by continuously purifying the etchant, thereby enhancing operational reliability.
Implementation Method 1
A drain port may be provided at a lower-most location of the inclined tank floor, and one or more outlet ports may be provided on the inclined tank floor at a location higher than the drain port. The drain port may be configured to drain the etchant from the tank through a debris-removal system
Implementation Method 2
The recirculation system may be configured to treat the etchant passing therethrough and return the treated etchant to the process tank
Data Source
AI summary
A wet etching system includes a process tank having an inclined tank floor. A drain port is provided at the lower-most location of the inclined tank floor and one or more outlet ports are provided on the inclined tank floor at a location higher than the drain port. The drain port is configured to drain etchant from the tank through a debris-removal system, and the outlet ports are configured to drain the etchant from the tank through a recirculation system.