Window Etching with Moving Pads for Gentle Slope Formation

The patent applies preliminary action by pre-positioning pads on the etching apparatus before the etching process begins. These pads are placed at specific locations on the window substrate to control the etching depth and create the gentle slope in the etched portion. The pads remain in place during the etching process, preventing etching in certain areas while allowing it in others, thereby achieving the desired slope without requiring complex post-processing.

The patent implements local quality by using pads with different properties or configurations at different locations on the window substrate. Each pad may have different dimensions, materials, or positions, creating locally varied etching conditions. This allows different regions of the window to have different etching depths and slope characteristics, achieving the gentle slope in specific areas while maintaining other functional areas.

The patent applies continuity of useful action by maintaining the pads in continuous contact with the window substrate throughout the etching process. The etching solution continuously flows over the substrate, and the pads continuously prevent etching in protected areas. This continuous action ensures consistent etching depth and slope formation without interruption, achieving both productivity and precision.

The patent uses pads as intermediary elements between the etching solution and the window substrate. The pads mediate the etching process by selectively blocking the etchant from reaching certain areas while allowing it to act on other areas. This intermediary role enables precise control over the etching pattern and slope formation, maintaining manufacturing precision even during continuous processing.