Windowless Ionization Device Plasma Deflection
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Solution Overview
Problem
Existing systems for generating and delivering vacuum ultraviolet (VUV) light for photochemistry applications face challenges due to the scarcity of window materials, absorption by windows, contamination of reflective optics, and the high costs and power requirements of lasers and synchrotrons, as well as interference from plasma ions and electrons in windowless devices that reduce the reliability of analyte ion detection.
Innovation Solution
An ionization device with a plasma source and a plasma deflection system using electrodes to create an electric field and magnets to create a magnetic field, which prevents plasma ions and electrons from entering the ionization region, allowing efficient coupling of VUV light to a gas sample while minimizing contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a window is used to deliver VUV light to the sample area, then the light can be directed and concentrated, but the window absorbs a large fraction of the light and reduces transmission efficiency
Solution Approach 1:
The patent removes the window component entirely from the VUV light delivery path. By using a windowless design where the plasma source is positioned directly adjacent to the sample area, the harmful absorption effect is eliminated while maintaining effective light delivery through direct exposure geometry.
Solution Approach 2:
The patent introduces a magnetic field as an intermediary to manage plasma particles. The magnetic field confines plasma electrons and ions within the plasma source region, preventing them from contaminating the sample area while allowing VUV photons to pass freely to illuminate the sample.
2Illumination intensity
If a windowless design is used to allow greater light transmission, then more light reaches the sample, but plasma ions and electrons travel through the aperture and contaminate the ionization region
Solution Approach 1:
The patent introduces a magnetic field as an intermediary to manage plasma particles. The magnetic field confines plasma electrons and ions within the plasma source region, preventing them from contaminating the sample area while allowing VUV photons to pass freely to illuminate the sample.
Solution Approach 2:
The patent applies different physical constraints to different regions: the plasma source region uses magnetic confinement to trap charged particles, while the sample region maintains open access for photon transmission. This spatial differentiation of constraints allows each region to optimize its function without interfering with the other.
3Ease of operation
If plasma ions are present in the ionization region, then the aperture can remain open for light transmission, but interfering peaks with analyte ions reduce detection reliability
Solution Approach 1:
The magnetic field acts as a selective mediator that allows neutral VUV photons to pass through to the sample region while blocking charged plasma ions and electrons. This enables the aperture to remain open for optimal light transmission while maintaining detection reliability by preventing plasma particle contamination.
4Device complexity
If plasma electrons and ions are allowed to reach the sample, then the aperture design is simplified, but hard ionization occurs in an uncontrolled manner reducing measurement precision
Solution Approach 1:
The magnetic field serves as a controllable intermediary that selectively filters plasma particles based on their charge. This maintains a simple aperture design while ensuring measurement precision by preventing uncontrolled hard ionization, allowing only soft photoionization by VUV photons to occur in the sample region.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents plasma ions and electrons from contaminating the ionization region, enhancing the reliability of analyte ion detection and improving the efficiency of VUV light delivery to the sample, thereby improving the accuracy and reliability of photochemistry applications.
Implementation Method 1
a plasma source configured to generate a plasma. The plasma comprises light, plasma ions and plasma electrons
Implementation Method 2
a plasma deflection device comprising a plurality of electrodes configured to establish an electric field, wherein the electric field substantially prevents the plasma ions from entering the ionization region
Implementation Method 3
a magnet configured to establish a magnetic field to guide plasma electrons. The magnetic field substantially prevents the plasma electrons of the plasma from exiting through the aperture
Implementation Method 4
at least part of the light passes through the aperture and is incident on a gas sample
Data Source
AI summary
An ionization device comprises: a plasma source configured to generate a plasma. The plasma comprises light, plasma ions and plasma electrons. The plasma source comprises an aperture disposed such that at least part of the light passes through the aperture and is incident on a gas sample. The ionization device further comprises an ionization region; and a plasma deflection device comprising a plurality of electrodes configured to establish an electric field, wherein the electric field substantially prevents the plasma ions from entering the ionization region.