Wire-Array Aberration Corrector for Charged Particle Beam Resolution
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Solution Overview
Problem
Charged particle beam systems, such as electron microscopes, suffer from beam aberrations like spherical aberration, which limit resolution and throughput.
Innovation Solution
Implementing correctors with line deflectors, line deflectors combined with an octupole, or cylindrical deflectors to correct spherical aberration, utilizing a plurality of wires with different voltages to generate an electrical field that approximates a specific proportionality to the distance from the beam axis, providing rotational symmetry and correcting aberrations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional lenses are used to focus charged particle beams, then focusing capability is achieved, but spherical aberration occurs that limits resolution
Solution Approach 1:
The patent introduces a corrector as an intermediary component between the lens and the sample. This corrector comprises multiple wires arranged in a specific pattern that generate an electrical field to compensate for the spherical aberration introduced by the focusing lens, thereby improving resolution without sacrificing focusing capability
Solution Approach 2:
The patent changes the electrical parameters (voltages) applied to individual wires in the corrector to dynamically adjust and compensate for spherical aberration. By varying the voltage on each wire, the system can optimize the electrical field distribution to counteract the aberration effects and improve beam focusing
2Measurement precision
If aberration correctors are added to charged particle beam systems, then resolution is improved, but device complexity increases
Solution Approach 1:
The corrector is segmented into multiple independent wires instead of using a complex continuous structure. Each wire can be independently controlled and optimized, allowing the system to achieve aberration correction through a modular, manageable configuration that reduces overall structural complexity
Solution Approach 2:
The patent replaces complex mechanical aberration correction mechanisms with an electrical field-based corrector. By using electrically controllable wires to generate the necessary field distribution, the system achieves aberration correction without complex mechanical moving parts or adjustments
3Measurement precision
If multiple wires with different voltages are used in the corrector, then aberration correction precision is improved, but manufacturing complexity increases
Solution Approach 1:
The corrector is divided into multiple discrete wires that can be individually fabricated and positioned. This segmentation allows for precise control of each wire's voltage and position, enabling high-precision aberration correction while maintaining manufacturing feasibility through modular assembly
Solution Approach 2:
Different regions of the corrector (different wires) are assigned different voltages to create the specific electrical field distribution needed for aberration correction. This local differentiation of electrical properties allows precise correction while the wires themselves can be manufactured using standard techniques
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves resolution and current density in charged particle beam systems, enabling cost-effective aberration correction and enhancing the performance of tools like electron microscopes.
Implementation Method 1
providing a first voltage to a first wire and providing a second voltage to a second wire of the plurality of wires, the second voltage being different than the first voltage
Data Source
AI summary
A corrector for correcting aberrations of a charged particle beam in a charged particle beam device is described. The corrector includes a plurality of wires configured to be in a plane perpendicular to a beam axis. The wires forming two or more openings for passing of the charged particle beam through the two or more openings. The plurality of wires includes at least a first wire having a first connector configured to provide a first voltage to the first wire and a second wire having a second connector configured to provide a second voltage to the second wire. The second voltage being different than the first voltage.


