Wire Grid Polarizer Doping for High-Resolution Display Transmittance
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Solution Overview
Problem
Existing display devices, particularly head-mounted displays, face challenges in achieving high-resolution images due to limitations in polarizer technology, which affect the transmittance and polarization degree, necessitating improved wire grid polarizers for enhanced performance.
Innovation Solution
A display device comprising a substrate with a display element layer, a phase retardation layer, and a wire grid polarizer with stacked insulating and grid patterns containing doped ions, specifically boron, to enhance etching selectivity and uniformity of the wire grid polarizer, thereby improving the transmittance and the polarization degree.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional polarizer technology is used, then the device structure is simple, but the transmittance and polarization degree are insufficient for high-resolution displays
Solution Approach 1:
The wire grid polarizer is segmented into multiple functional layers: a lower electrode layer, an upper electrode layer, and an insulating layer positioned between them. This segmentation allows each layer to contribute specifically to the overall polarization function, enabling high polarization degree through the coordinated action of separated conductive elements rather than requiring a single complex structure
Solution Approach 2:
The wire grid polarizer employs a composite structure combining conductive materials (electrodes) with insulating materials. The insulating layer with specific dielectric properties is positioned between the electrode layers to prevent electrical shorting while maintaining the optical polarization function. This composite approach enables both high transmittance and high polarization degree by optimizing the interaction between different material properties
2Manufacturing precision
If the wire grid polarizer uses complex stacked patterns, then the transmittance and polarization degree improve, but the manufacturing difficulty increases
Solution Approach 1:
The insulating layer is positioned locally between the lower and upper electrode layers at specific regions where electrical isolation is required. This local positioning of the insulating material allows the wire grid structure to maintain high etching selectivity in critical areas while simplifying the overall manufacturing process by not requiring insulating material throughout the entire structure
Solution Approach 2:
The patent optimizes the thickness of the insulating layer within a specific range (10-100 nm) to achieve the desired balance between electrical isolation and optical performance. By controlling the insulating layer thickness parameter, the manufacturing process can achieve high etching selectivity without requiring excessively complex fabrication steps, as the thickness parameter alone provides sufficient control over the polarizer's electrical and optical properties
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The wire grid polarizer, with stacked insulating and grid patterns containing doped ions, specifically boron, to enhance etching selectivity and uniformity of the wire grid polarizer, thereby improving the transmittance and the polarization degree of the wire grid polarizer, thereby improving the transmittance and the polarization degree.
Implementation Method 1
The insulating pattern and the grid pattern contain doped ions. In an embodiment, the doped ions contain boron.
Data Source
AI summary
A display device and a method of manufacturing the same are provided. The display device comprises a substrate, a display element layer disposed on the substrate, and comprising a first electrode, a light-emitting layer, and a second electrode, a phase retardation layer disposed on the display element layer, and a wire grid polarizer disposed on the phase retardation layer, and comprising a wire grid pattern in which an insulating pattern and a grid pattern are stacked, wherein the insulating pattern and the grid pattern contain doped ions.


