Wire Grid Polarizer Manufacturing via Mechanical Molding
Solution Overview
Problem
Existing photolithography techniques face difficulties in manufacturing wire grid polarizers with pitches of 120 nm or less, which are necessary for efficient light polarization and reuse.
Innovation Solution
A method involving the formation of a dielectric layer on a resin substrate with grid-shaped convex portions, followed by the deposition of metal wires, using a mold with a concavo-convex grid pattern and uniaxial drawing to achieve pitches of 120 nm or less, and employing oblique metal deposition to enhance adhesion and optical characteristics.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing photolithography technique is used, then manufacturing process is established, but manufacturing precision of wire grid with pitches of 120 nm or less deteriorates
Solution Approach 1:
The patent replaces the photolithography process (optical/mechanical system) with a direct molding process using a mold having concavo-convex portions. This mechanical molding approach enables precise formation of wire grids with pitches of 120 nm or less, overcoming the resolution limits of photolithography while simplifying the manufacturing process.
Solution Approach 2:
The patent changes the fundamental manufacturing parameter from optical exposure (photolithography) to mechanical molding. By using a mold with precisely formed concavo-convex portions, the process achieves the required pitch precision of 120 nm or less, transforming the manufacturing approach to one that naturally accommodates the desired dimensional precision.
2Reliability
If pitch is reduced to 120 nm or less, then polarization efficiency is improved, but manufacturing capability deteriorates
Solution Approach 1:
The patent replaces photolithography with mechanical molding using a mold having concavo-convex portions. This substitution enables precise control of pitch at 120 nm or less, achieving the required polarization efficiency while overcoming the manufacturing limitations of optical methods.
Solution Approach 2:
The patent prepares a mold with precisely formed concavo-convex portions before the manufacturing process. This preliminary preparation of the mold ensures that the wire grid pitch is precisely controlled at 120 nm or less during production, achieving both the required manufacturing precision and polarization efficiency.
3Ease of manufacture
If conventional photolithography is used, then process simplicity is maintained, but achievement of pitches of 120 nm or less deteriorates
Solution Approach 1:
The patent replaces the complex multi-step photolithography process with a simpler mechanical molding process. By using a mold with pre-formed concavo-convex portions, the process achieves pitches of 120 nm or less while reducing manufacturing complexity, as the pattern is directly transferred through molding rather than requiring photoresist coating, exposure, and development steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the production of wire grid polarizers with microstructural concavo-convex grids having pitches of 120 nm or less, achieving high degrees of polarization (99.9% or more) across the visible region and simplifying the manufacturing process compared to traditional photolithography.
Implementation Method 1
performing uniaxial drawing on a drawing target member with a concavo-convex grid with pitches of 100 nm to 100 μm on its surface, in the direction substantially parallel to a longitudinal direction of the concavo-convex grid
Implementation Method 2
forming a dielectric layer on a region including grid-shaped convex portions of a resin substrate
Implementation Method 3
metal wires are formed by depositing metal in the direction of an about 30° or less angle formed between the normal of the plane of the resin substrate and a source of vapor deposition
Data Source
AI summary
A dielectric layer 2 is formed on a region including grid-shaped convex portions 1a of a resin substrate 1 having the grid-shaped convex portions 1a with pitches of 80 nm to 120 nm on its surface, and metal wires 3 are formed on the dielectric layer 2. It is thereby possible to obtain a wire grid polarizer having a microstructural concavo-convex grid with pitches of the level of 120 nm or less that has not been implemented.