Wire Grid Polarizing Plate Etching Control
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Solution Overview
Problem
The manufacturing of wire grid polarizing plates with high aspect ratio structures is challenging due to the need for precise processing of reflective layers, and existing absorption type polarizing plates are difficult to process and have limitations in optical properties.
Innovation Solution
A polarizing plate with a wire grid structure featuring a transparent substrate, protrusions with a reflective layer, a multilayer film, and an optical property improving layer made of an oxide that has a higher etching rate than the multilayer film, allowing for improved optical properties and processing control using chlorine-based gases.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a multilayer film structure is used in absorption type polarizing plates to reduce reflected light, then optical properties are improved, but processing difficulty increases and manufacturing becomes more complex
Solution Approach 1:
An optical property improving layer is introduced as an intermediary between the reflective layer and the multilayer film. This intermediate layer facilitates processing by providing a buffer zone that enables controlled etching and pattern formation, thereby reducing the overall processing difficulty while maintaining the optical benefits of the multilayer structure
Solution Approach 2:
The patent specifies precise etching rate ratios (6.7-15 times faster for the optical property improving layer compared to the multilayer film) to enable selective processing. By controlling this critical parameter, the complex multilayer structure can be manufactured with appropriate selectivity, allowing the reflective layer to be patterned without excessive damage to other layers
2Ease of manufacture
If the etching rate of the optical property improving layer is too high relative to the multilayer film, then processing selectivity is improved, but control precision during manufacturing deteriorates
Solution Approach 1:
The patent defines a specific range for the etching rate ratio (6.7-15 times) to optimize the balance between selectivity and control precision. This parameter optimization ensures that the optical property improving layer etches sufficiently faster than the multilayer film for easy processing, while maintaining enough control to prevent complete removal or excessive damage to underlying layers
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the production of polarizing plates with enhanced optical properties and improved processing efficiency, reducing reflectivity and enhancing transmittance, suitable for various optical applications.
Implementation Method 1
An etching rate of the optical property improving layer with respect to a chlorine-based gas is no less than 6.7 times and no more than 15 times an etching rate of the multilayer film
Data Source
AI summary
Provided is a polarizing plate that is a polarizing plate having a wire grid structure, and includes a transparent substrate and a plurality of protrusions that extend in a first direction on the transparent substrate and are periodically arranged at a pitch shorter than a wavelength of light in a use band. Each of the protrusions includes a reflective layer, a multilayer film, and an optical property improving layer located between the reflective layer and the multilayer film. The optical property improving layer contains an oxide that contains a constituent element of which the reflective layer is composed. An etching rate of the optical property improving layer with respect to a chlorine-based gas is no less than 6.7 times and no more than 15 times an etching rate of the multilayer film.