Wire Saw Sidewall Displacement Control for Wafer Surface Profile

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Solution Overview

Problem

Existing wire saws used to slice ingots into wafers often result in surface defects leading to warped wafers, which require additional costly and time-consuming processing steps due to the inability to control frame displacement and surface profile effectively.

Innovation Solution

A method and system that measure and control the displacement of the wire saw frame's sidewall using sensors and displacement devices, applying pressure based on measured data to adjust the sidewall position, employing predictive or reactive control processes to counteract displacement and maintain desired surface profiles.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional wire saws are used to slice ingots into wafers, then the cutting operation can be performed, but surface defects occur leading to warped wafers that require additional processing steps

Engineering Contradiction:
Improvewafer surface profileVSAvoidadditional processing time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The system measures displacement of the sidewall before it causes significant wafer warping and applies counteracting pressure in advance to prevent the displacement from occurring during the critical cutting phase. This preliminary action prevents surface defects before they happen, eliminating the need for subsequent corrective processing steps.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system continuously measures the actual displacement of the sidewall during operation and uses this feedback to adjust the counteracting pressure dynamically. This closed-loop control ensures that the sidewall displacement is maintained within acceptable limits throughout the cutting process, preventing wafer warping and surface defects.

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If conventional wire saws are used to slice ingots into wafers, then the cutting operation can be performed, but surface defects occur leading to warped wafers that require additional processing steps

Engineering Contradiction:
Improvewafer surface profileVSAvoidmanufacturing complexity
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The system introduces a displacement device as an intermediary between the sidewall and the frame structure. This intermediary applies controlled counteracting pressure to the sidewall to prevent displacement without requiring fundamental changes to the wire saw's core cutting mechanism, thus improving manufacturing precision while maintaining relative ease of manufacture.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Device complexity

If frame displacement is not controlled, then the wire saw structure remains simple, but wafer surface profile deviates from standards requiring additional processing

Engineering Contradiction:
Improvewire saw structureVSAvoidwafer surface profile
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The system segments the control function by separating the measurement function (sensor for measuring sidewall displacement) from the actuation function (displacement device for applying counteracting pressure). This segmentation allows the complex control task to be divided into manageable components that can be integrated into the existing wire saw structure without requiring complete redesign.

Inventive Principle:
Principle #1Segmentation

4Manufacturing precision

If real-time measurement and control of sidewall displacement is implemented, then wafer surface profile is controlled effectively, but the system complexity increases

Engineering Contradiction:
Improvewafer surface profileVSAvoidcontrol system
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The system is designed to measure its own sidewall displacement and automatically generate the appropriate counteracting pressure without requiring external intervention or complex centralized control. The displacement device responds directly to measurements from the sensor, creating a self-regulating system that reduces overall control complexity while maintaining high manufacturing precision.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach effectively controls the surface profile and warp of wafers by actively counteracting frame and bearing displacements, reducing the need for additional processing steps and enhancing manufacturing efficiency and yield.

Implementation Method 1

determining a pressure profile for adjusting a position of the sidewall based on the stored displacement data of the sidewall, and applying pressure to the sidewall with a displacement device according to the determined pressure profile

Methodology Applied
Scientific EffectPressure: Pressure Increase

Data Source

PatentUS10654193B2Methods and system for controlling a surface profile of a wafer
Publication Date: 2020.05.19 GLOBALWAFERS CO LTD
  • US10654193B2 patent drawing
  • US10654193B2 patent drawing
  • US10654193B2 patent drawing

AI summary

Methods for controlling the surface profiles of wafers sliced from an ingot with a wire saw include measuring an amount of displacement of a sidewall of a frame of the wire saw. The sidewall is connected to a bearing of a wire guide supporting a wire web in the wire saw. Based on the measured amount of displacement of the sidewall, a pressure profile for adjusting a position of the sidewall is determined by a computing device. Pressure is applied to the sidewall using a displacement device according to the determined pressure profile to control the position of the sidewall.