Wireless Plasma Diagnosis Circuit for In-Situ Semiconductor Control
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Solution Overview
Problem
Current methods for measuring plasma characteristics in semiconductor fabrication processes are inadequate, leading to inconsistencies in plasma formation and reduced yields in semiconductor devices.
Innovation Solution
A plasma diagnosis apparatus with a transformer, current detection circuit, and signal processing circuit is integrated into the semiconductor fabrication system, allowing for in-situ diagnosis of plasma characteristics using a wireless, battery-powered device that can be transported and loaded automatically, and transmitting data for real-time control of plasma generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If plasma characteristics are measured using conventional methods (optical or electrical probes), then plasma measurement capability is provided, but measurement precision and reliability are insufficient leading to inconsistent plasma formation
Solution Approach 1:
The patent replaces conventional electrical probe measurement methods with a wireless measurement system that uses electromagnetic coupling through a transformer. The measurement probe is electrically isolated from the plasma chamber ground, eliminating ground loop interference and improving measurement precision while enhancing system reliability.
Solution Approach 2:
The patent introduces a transformer as an intermediary device between the measurement probe and the external measurement system. The transformer enables wireless signal transmission while providing electrical isolation, allowing accurate plasma characteristic measurement without direct electrical connection to the plasma chamber ground.
2Reliability
If a wireless battery-powered plasma diagnosis apparatus is used, then measurement reliability is improved, but power supply complexity increases due to battery and wireless charging circuit requirements
Solution Approach 1:
The plasma diagnosis apparatus is equipped with a battery for autonomous power supply and a wireless charging circuit that enables automatic recharging when the apparatus is placed on a charging platform. This self-service power management system eliminates the need for external power cables, improving measurement reliability while managing power supply complexity through automation.
3Manufacturing precision
If in-situ plasma diagnosis is performed during semiconductor fabrication, then manufacturing precision is improved, but device complexity increases due to integration of multiple circuits and components
Solution Approach 1:
The patent integrates multiple functional circuits (measurement circuit, wireless communication circuit, battery management circuit, and wireless charging circuit) into a single compact plasma diagnosis apparatus. This consolidation enables in-situ plasma characterization during semiconductor fabrication processes while managing device complexity through integrated design.
Solution Approach 2:
The plasma diagnosis apparatus is designed as a multi-functional device that can perform plasma characteristic measurement, wireless data transmission, autonomous power supply, and wireless recharging. This universal design allows the single apparatus to handle multiple tasks, improving manufacturing precision without proportionally increasing device complexity.
4Productivity
If real-time plasma diagnostic data is collected and used for process control, then productivity is improved through yield enhancement, but loss of time increases due to data acquisition and processing requirements
Solution Approach 1:
The patent enables continuous real-time plasma diagnosis during semiconductor fabrication processes through wireless measurement and data transmission. By performing measurements in-situ without interrupting the fabrication process, the system maintains continuous production flow while acquiring plasma diagnostic data, thus improving productivity without significant time loss.
Solution Approach 2:
The plasma diagnosis apparatus provides real-time feedback on plasma characteristics during the fabrication process. This feedback enables dynamic adjustment of process parameters to optimize plasma conditions, improving semiconductor device yield while minimizing time loss through immediate corrective actions rather than post-process analysis.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution improves the uniformity, density, and distribution of plasma, enhancing the semiconductor process and increasing device yields by providing accurate, real-time diagnostic data for controlling plasma generation.
Implementation Method 1
a transformer having a primary wound line connected to the current detection circuit and a secondary wound line connected to the probe
Implementation Method 2
a current signal from plasma introduced through the probe
Data Source
AI summary
A plasma diagnosis apparatus comprising; an upper substrate, a lower substrate stacked with the upper substrate, at least one probe on the upper substrate, a plasma diagnosis circuit mounted in the lower substrate and configured to diagnose plasma in a chamber through the probe, a wireless communication circuit mounted in the lower substrate and configured to wirelessly transmit a result of the plasma diagnosis circuit to an external device, a battery mounted in the lower substrate and configured to supply power to the plasma diagnosis circuit and the wireless communication circuit, and a wireless charging circuit mounted in the lower substrate and configured to wirelessly charge the battery. The plasma diagnosis circuit includes a transformer, a first circuit connected to a primary wound line of the transformer, a second circuit connected between a secondary wound line of the transformer and the probe, a current detection circuit connected to the primary wound line of the transformer, and a signal processing circuit configured to generate data with diagnostic characteristics of the plasma based on an output of the current detection circuit.