Wiring Circuit Board Dummy Pattern for Uniform Plating Thickness

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Solution Overview

Problem

Conventional methods for producing printed wiring boards face challenges in achieving uniform thickness of the conductive pattern near openings, as the dummy pattern is formed outside the region where the printed wiring board is formed, making it difficult to maintain uniformity.

Innovation Solution

A method involving setting pattern and opening forming regions on a supporting layer, forming an insulating layer, and using electrolytic plating to create a conductive pattern with a dummy pattern in the opening region, ensuring uniform metal ion concentration and supporting the dummy pattern with an insulating layer during etching.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the dummy pattern is formed outside the region where the printed wiring board is formed, then the opening can be formed in the printed wiring board, but the thickness of the wiring pattern formed near the opening becomes non-uniform

Engineering Contradiction:
Improveuniformity of conductive pattern thicknessVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent divides the substrate into distinct pattern forming regions and opening forming regions, allowing separate processing optimization for each area while maintaining overall uniformity through the dummy pattern placement strategy

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The dummy pattern is formed in advance within the opening forming region before the actual pattern formation, pre-establishing the metal ion distribution environment to ensure uniform thickness in subsequent plating operations

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If the dummy pattern is formed in the opening forming region, then uniform thickness of the conductive pattern can be achieved, but the dummy pattern needs support during etching

Engineering Contradiction:
Improveuniformity of conductive pattern thicknessVSAvoidsupport structure requirements
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

An insulating layer is introduced as an intermediary support structure between the dummy pattern and the substrate, providing mechanical support during etching while being electrically insulating and chemically resistant to the plating solution

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The insulating layer is selectively formed only in the opening forming region where the dummy pattern is located, providing localized support where needed while leaving other regions unaffected

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method achieves uniform thickness of the conductive pattern near openings by maintaining consistent metal ion concentration and supporting the dummy pattern, allowing for effective etching and removal without compromising pattern integrity.

Implementation Method 1

a third step of forming, by electrolytic plating, a conductive pattern on the insulating layer in the pattern forming region and a dummy pattern in the opening forming region

Methodology Applied
Scientific EffectElectrolytic plating: Electroplating

Implementation Method 2

a fourth step of etching at least a portion of the supporting layer in the opening forming region

Methodology Applied
Scientific EffectEtching:

Data Source

PatentUS20240284600A1Method for producing wiring circuit board
Publication Date: 2024.08.22 NITTO DENKO CORP
  • US20240284600A1 patent drawing
  • US20240284600A1 patent drawing
  • US20240284600A1 patent drawing

AI summary

A method for producing a wiring circuit board includes a first step of setting a pattern forming region and an opening forming region in a supporting layer; a second step of forming a base insulating layer on the supporting layer at least in the pattern forming region; a third step of forming, by electrolytic plating, a conductive pattern on the base insulating layer in the pattern forming region and a dummy pattern in the opening forming region; and a fourth step of etching at least a portion of the supporting layer in the opening forming region.