Semiconductor Wiring Substrate Layout for Dense Low-Crosstalk Routing

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Solution Overview

Problem

Existing semiconductor designs face challenges in achieving high routing flexibility and signal integrity, particularly with the increasing demands of high-bandwidth memory applications.

Innovation Solution

A semiconductor wiring substrate design featuring alternately arranged signal and ground traces with wider ground traces, a redistribution layer, and a power/ground layout, which allows for increased channel width and improved signal transmission without increasing the spacing between solder bumps, enhancing routing flexibility and signal integrity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If the channel width is increased to improve routing flexibility and signal integrity, then the spacing between solder bumps must be increased, but this increases the overall device area and reduces integration density

Engineering Contradiction:
Improverouting flexibilityVSAvoiddevice area
Core Design Contradiction:
Adaptability or versatilityVSArea of stationary object

Solution Approach 1:

The patent transitions from a traditional planar layout to a 3D stacked architecture with multiple circuit layers (first circuit layer, second circuit layer, third circuit layer) separated by dielectric layers. This vertical dimensionality allows signal traces to be routed across multiple layers, effectively increasing routing flexibility without requiring larger horizontal spacing between solder bumps on the same layer

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent divides the circuit into multiple segmented layers with dedicated functions: signal transmission layers, power/ground layers, and redistribution layers. Each layer is optimized for specific purposes, allowing independent optimization of signal integrity and routing without compromising overall device area

Inventive Principle:
Principle #1Segmentation

2Reliability

If wider ground traces are used to reduce crosstalk and improve signal quality, then the channel width increases, but this reduces the number of channels that can be packed in a given area

Engineering Contradiction:
Improvesignal qualityVSAvoidchannel density
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent uses multiple vertical layers to accommodate both wide ground traces for signal integrity and multiple channels for high density. By distributing channels across different Z-height layers, the system achieves both wide traces on each layer and high overall channel count without horizontal spacing constraints

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

Different layers are assigned different local qualities: signal layers have optimized trace widths for low crosstalk, power/ground layers have wider traces for low impedance, and redistribution layers have optimized patterns for bump alignment. This local optimization allows each layer to be tuned for its specific function

Inventive Principle:
Principle #3Local quality

3Reliability

If the spacing between solder bumps is increased to accommodate wider channels, then signal integrity improves, but the land pattern area increases and manufacturing cost rises

Engineering Contradiction:
Improvesignal integrityVSAvoidmanufacturing cost
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent achieves signal integrity through vertical layering rather than horizontal spacing. Multiple circuit layers with controlled impedance and proper grounding can be implemented with standard bump pitch, avoiding the need for larger land patterns and reducing manufacturing costs

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS20250226330A1Semiconductor package device and semiconductor wiring substrate thereof
Publication Date: 2025.07.10 GLOBAL UNICHIP CORPORATION
  • US20250226330A1 patent drawing
  • US20250226330A1 patent drawing
  • US20250226330A1 patent drawing

AI summary

A semiconductor wiring substrate includes at least one circuit layer, at least one dielectric layer and a redistribution layer. The at least one circuit layer includes multiple signal traces and multiple ground traces alternately arranged on the at least one circuit layer, and has a channel width in a direction. The at least one dielectric layer is between the at least one circuit layer. The redistribution layer is above the at least one circuit layer, allows a first solder bump and a second solder bump to be placed, and includes a first metal contact and a second metal contact. The first solder bump and the second solder bump connect the at least one circuit layer through the first metal contact and the second metal contact, respectively. The channel width is greater than spacing between the first solder bump and the second solder bump in the direction.