Wiring Substrate Via Plating Thickness Control

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Solution Overview

Problem

Wiring substrates with varying via hole capacities and filled with different metal posts suffer from reliability issues due to height discrepancies, leading to connection failures and solder-related problems such as gaps or shorts.

Innovation Solution

The wiring substrate design includes a plurality of first wiring portions with an insulation layer and openings of varying capacities, where the via wiring is formed with an electroless plating structure that increases in thickness with the capacity of the opening, ensuring the electrolytic plated layers and metal posts have consistent heights across different openings.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If via holes of different capacities are filled with via wirings to accommodate varying electrical requirements, then the electrical performance and adaptability are improved, but the metal posts formed on the via wirings have different heights which decreases connection reliability

Engineering Contradiction:
Improvevia hole capacity variationVSAvoidconnection reliability
Core Design Contradiction:
Adaptability or versatilityVSReliability

Solution Approach 1:

The patent applies local quality by varying the electroless plating structure thickness specifically in regions with larger opening capacities. The via wiring includes an electroless plating structure with N layers where N≥0, and the thickness increases as the opening capacity increases. This localized adjustment ensures that metal posts on all via wirings achieve substantially the same height, resolving the reliability issue while maintaining adaptability to different electrical requirements.

Inventive Principle:
Principle #3Local quality

2Reliability

If the electroless plating structure thickness is increased in larger capacity openings to equalize metal post heights, then connection reliability is improved, but the manufacturing complexity increases

Engineering Contradiction:
Improveconnection reliabilityVSAvoidplating structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent employs parameter changes by systematically varying the electroless plating structure thickness based on opening capacity parameters. The via wiring includes an electroless plating structure with N layers where N≥0, and the thickness is adjusted as a controllable parameter according to the opening capacity. This approach allows precise control of metal post heights while maintaining a systematic and manageable manufacturing process.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enhances the reliability of connections by aligning the upper surfaces of connection terminals with the same plane, reducing the likelihood of connection failures and solder-related issues, while allowing for miniaturization of the wiring layer.

Implementation Method 1

The via wiring includes an electrolytic plated layer and an electroless plating structure including N layers where N represents an integer greater than or equal to zero. The electroless plating structure is arranged between the electrolytic plated layer and the upper surface of a corresponding one of the first wiring portions exposed in a bottom of a corresponding one of the openings.

Methodology Applied
Scientific EffectElectroless plating: Electroplating

Data Source

PatentUS10892217B2Wiring substrate and semiconductor device
Publication Date: 2021.01.12 SHINKO ELECTRIC IND CO LTD
  • US10892217B2 patent drawing
  • US10892217B2 patent drawing
  • US10892217B2 patent drawing

AI summary

A wiring substrate includes first wiring portions, an insulation layer covering the first wiring portions, openings extending through the insulation layer in a thickness-wise direction, partially exposing upper surfaces of the first wiring portions, and differing from each other in capacity, and second wiring portions, each of which includes a via wiring filling one of the openings and a columnar connection terminal electrically connected to the via wiring and arranged on an upper surface of the insulation layer. The via wiring includes an electrolytic plated layer and an electroless plating structure including N layers (N is integer and ≥0) arranged between the electrolytic plated layer and the upper surface of the first wiring portion exposed in a bottom of the opening. The via wiring is formed so that the electroless plating structure has a thickness that increases as a capacity of the opening filled with the via wiring is increased.