Wafer Level Package Internal Metallization Layer Thermal Management
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Solution Overview
Problem
Traditional wafer level packaging structures lack an internal conductive layer, which limits their ability to efficiently manage heat and electromagnetic interference (EMI) and reduces internal signal densities, as the existing metallization layers are not positioned optimally to provide effective shielding and heat spreading.
Innovation Solution
Incorporating an internal metallization layer within the compound mold, which is patterned to form electrical connections and structures such as heat spreaders, shields, and wiring layers, and is closer to the semiconductor die, allowing for improved thermal management and EMI shielding by reducing thermal resistance and proximity to noise sources.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If traditional wafer level packaging structures are used without an internal conductive layer, then the manufacturing process is simpler, but heat spreading and EMI shielding performance are insufficient
Solution Approach 1:
The patent embeds an internal metallization layer within the compound mold structure, nesting the conductive layer inside the packaging material. This allows the conductive layer to be positioned close to the die for effective heat spreading and EMI shielding while maintaining a compact overall package structure.
Solution Approach 2:
The patent introduces a new dimensional element by adding an internal metallization layer at a specific depth within the compound mold, rather than only using surface-level metallization. This internal positioning in the vertical dimension enables improved thermal and electromagnetic performance without significantly increasing horizontal footprint.
2Object-affected harmful factors
If an internal metallization layer is added closer to the die, then EMI shielding performance improves, but manufacturing complexity increases
Solution Approach 1:
The patent forms the internal metallization layer during the wafer-level packaging process before the compound mold is fully cured or sealed. This preliminary formation of the conductive layer allows for easier integration and reduces the need for additional post-processing steps that would increase manufacturing complexity.
3Temperature
If metallization layers are positioned farther from the die, then manufacturing is easier, but thermal resistance increases and heat spreading is reduced
Solution Approach 1:
The internal metallization layer is nested within the compound mold at an optimized distance from the die, typically positioned in the lower portion of the mold cavity. This nested positioning achieves low thermal resistance by being close to the heat source while remaining manufacturable through standard wafer-level packaging processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The internal metallization layer enhances heat spreading and shielding performance, leading to increased signal densities and overall package performance by being closer to the die, thus enabling higher performance and efficiency in semiconductor packages.
Implementation Method 1
the internal metallization layer enhances heat spreading and shielding performance, leading to increased signal densities and overall package performance by being closer to the die, thus enabling higher performance and efficiency in semiconductor packages
Implementation Method 2
Incorporating an internal metallization layer within the compound mold, which is patterned to form electrical connections and structures such as heat spreaders, shields, and wiring layers
Data Source
AI summary
An apparatus is described that includes a redistribution layer and a semiconductor die on the redistribution layer. An electrically conductive layer resides over the semiconductor die. A compound mold resides over the electrically conductive layer.


