Memory Word Line Layout for Compact Sense Amplifier Integration

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Solution Overview

Problem

Current semiconductor memory devices face challenges in reducing external size while maintaining circuit area, particularly in integrating a sense amplifier, due to the complexity of interconnects and transistor arrangements in the transfer regions.

Innovation Solution

The semiconductor memory device employs a structure where gate sharing transistors and gate separation transistors are strategically used in different regions to optimize interconnect routing and reduce the area occupied by transistors, allowing for a compact design that integrates a sense amplifier and column control circuit.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If gate sharing transistors and gate separation transistors are used in transfer regions, then interconnect routing is optimized and transistor area is reduced, but device complexity increases due to the strategic arrangement requirements

Engineering Contradiction:
Improvetransistor areaVSAvoidtransistor arrangement complexity
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The transfer region is divided into multiple sub-regions, with gate sharing transistors placed in first sub-regions and gate separation transistors placed in second sub-regions. This segmentation allows optimization of interconnect routing in different areas while managing transistor arrangement complexity through systematic zoning.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different transistor types are strategically assigned to different spatial locations within the transfer region. Gate sharing transistors are used in specific sub-regions where their structure benefits interconnect routing, while gate separation transistors are used in other sub-regions, creating local optimization rather than uniform design.

Inventive Principle:
Principle #3Local quality

2Length of stationary object

If external size is reduced, then device compactness is improved, but circuit area maintenance becomes difficult due to interconnect complexity

Engineering Contradiction:
Improveexternal sizeVSAvoidinterconnect complexity
Core Design Contradiction:
Length of stationary objectVSDevice complexity

Solution Approach 1:

The patent utilizes vertical stacking of conductive layers to route interconnects in the third dimension rather than only in the planar direction. This allows compact external footprint while maintaining sufficient circuit area through multi-layer interconnect routing that passes through transfer regions efficiently.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The transfer regions serve multiple functions: they contain transistors for signal transfer, provide routing paths for interconnects between memory cell arrays and peripheral circuits, and enable compact layout through the strategic placement of gate sharing and gate separation transistors. This multi-functionality allows external size reduction without sacrificing circuit area.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentEP4294149A1Semiconductor memory device
Publication Date: 2023.12.20 KIOXIA CORP
  • EP4294149A1 patent drawingFigure 1
  • EP4294149A1 patent drawingFigure 2
  • EP4294149A1 patent drawingFigure 3

AI summary

According to one embodiment, a semiconductor memory device (10) includes first (WL0), second (WL1), third (WL3) and fourth (WL4) word lines coupled to first, second, third and fourth memory cells, respectively. A first transistor (WLSW0) includes a first gate and is electrically coupled to the first word line. A second transistor (WLSW1) includes a second gate and is electrically coupled to the second word line. A third transistor (WLSW3) includes a third gate and is electrically coupled to the third word line. A fourth transistor (WLSW4) includes a fourth gate and is electrically coupled to the fourth word line. The first gate is included in a first conductive layer. The second gate is included in a second conductive layer arranged away from the first conductive layer. The third and fourth gates are included in a third conductive layer which is integral and continuous.