Magnetic Write Pole Leading Bevel Fabrication
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Solution Overview
Problem
Conventional magnetic recording head fabrication methods require multiple complex process steps, leading to longer fabrication times and lower yields, with variations in sidewall shapes and locations resulting in poorer performance.
Innovation Solution
A method that starts with a flat underlayer and etch stop layer, followed by a conformally deposited intermediate layer, which is etched to form a trench that naturally forms a leading bevel without additional processing, allowing for simpler formation of the main pole with reduced variations in trench width and improved geometry.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Shape
If multiple deposition and etch or milling steps are used to provide a sloped surface, then the leading bevel can be formed, but the fabrication time increases and manufacturing complexity increases
Solution Approach 1:
The underlayer is pre-formed with a sloped surface at the ABS location before subsequent deposition and etching steps. This preliminary formation of the slope allows the leading bevel to be created in later steps without requiring additional complex processing, thereby reducing overall fabrication time while maintaining the required geometry.
Solution Approach 2:
The fabrication process is divided into distinct stages: first forming the underlayer with the sloped surface, then depositing the etch stop layer, followed by conformal deposition of the intermediate layer, and finally selective etching to form the trench. This segmentation allows each step to be optimized independently and simplifies the overall process compared to forming the bevel in a single complex operation.
2Shape
If multiple deposition and etch or milling steps are used to provide a sloped surface, then the leading bevel can be formed, but the device complexity increases
Solution Approach 1:
The sloped surface is prepared in advance on the underlayer, which simplifies subsequent steps. Instead of creating the bevel geometry through multiple complex operations later in the process, the foundation is laid early, reducing the complexity of later deposition and etching steps.
Solution Approach 2:
The conformally deposited intermediate layer automatically follows the slope of the underlayer and etch stop layer, self-forming the leading bevel geometry during the etching process. This self-service mechanism eliminates the need for additional bevel-forming operations, reducing fabrication process complexity.
3Manufacturing precision
If conventional fabrication methods are used, then the pole can be formed, but variations in sidewall shapes and locations occur resulting in poorer performance
Solution Approach 1:
The underlayer and etch stop layer are formed with precise, flat surfaces before deposition. This preliminary precision ensures that the conformally deposited intermediate layer and subsequently formed trench have consistent sidewall geometries, reducing variations and improving transducer performance.
Solution Approach 2:
The conformal deposition process automatically creates uniform intermediate layer thickness and slope angles throughout the structure. The subsequent etching process, terminating at the etch stop layer, self-regulates to produce consistent trench sidewalls. This self-service mechanism minimizes variations in sidewall shapes and locations, enhancing manufacturing precision and device reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the formation of the leading bevel, reduces fabrication time, and improves yield and performance by eliminating the need for complex processing steps and minimizing variations in sidewall shapes, while maintaining the geometry of the pole tip.
Implementation Method 1
The aluminum oxide intermediate layer is conformally deposited, via step 16
Implementation Method 2
The RIE is performed in the presence of the mask. The RIE proceeds until the etch stop layer 54 is reached
Implementation Method 3
For example Ru or another conductive material may be deposited via chemical vapor deposition (CVD), sputtering, or some other method
Implementation Method 4
The main pole is then provided, via step 24. Step 24 typically includes plating high saturation magnetization pole materials
Implementation Method 5
planarizing these material(s) using a chemical mechanical planarization (CMP)
Data Source
AI summary
A method provides a magnetic transducer having an air-bearing surface (ABS) location. An intermediate layer having a substantially flat bottom surface is provided. A trench is formed in the intermediate layer. The trench is wider in yoke region than in the pole tip region. The trench has a first depth in the yoke region and a second depth less than the first depth in the pole tip region. A portion of the intermediate layer is at the bottom of the trench at the ABS location. A nonmagnetic layer is provided. The nonmagnetic layer fills part of the trench in the pole tip region such that the trench has a third depth less than the second depth at the ABS location. A main pole is provided. The main pole has a leading bevel adjacent to nonmagnetic layer in the portion of the pole tip region of the trench.