Multi-Charged Particle Beam Writing Data Generation Using Vertex Sequences

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Solution Overview

Problem

The increasing complexity of semiconductor device circuits requires high-precision electron beam writing, which results in enormous data volumes due to the need for accurate approximation of curved figures into polygonal shapes, leading to inefficiencies in data processing and throughput in multi-beam writing apparatuses.

Innovation Solution

A method for generating writing data that refers to library data to extract and represent portions of figures using vertex sequences, reducing data volume by identifying and connecting vertices with pre-defined sequences, thereby reducing data processing time and improving throughput.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If curved figures are approximated with high accuracy using polygonal shapes, then manufacturing precision is improved, but data volume increases enormously

Engineering Contradiction:
Improveapproximation accuracyVSAvoiddata volume
Core Design Contradiction:
Manufacturing precisionVSQuantity of substance

Solution Approach 1:

The patent segments curved figures into a limited number of standard polygonal shapes (triangles, quadrilaterals, pentagons, hexagons) with predefined vertex sequences. By dividing complex curves into these standardized segments, the system achieves sufficient approximation accuracy while dramatically reducing the number of vertices needed compared to high-precision polynomial approximations, thus lowering data volume.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent changes the representation parameters from continuous coordinate data for each vertex to discrete vertex sequence identifiers that reference pre-defined standard shapes. This parameter transformation allows the system to maintain acceptable manufacturing precision while encoding curved figures using much fewer data elements, directly addressing the data volume issue.

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If the number of vertices and figures is increased for high accuracy approximation, then manufacturing precision is improved, but processing time increases

Engineering Contradiction:
Improveapproximation accuracyVSAvoiddata processing time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent performs preliminary action by pre-defining standard vertex sequences for common polygonal shapes and storing them in a library. During writing operations, the system references these pre-prepared sequences rather than calculating vertex coordinates in real-time, significantly reducing processing time while maintaining adequate approximation accuracy for manufacturing purposes.

Inventive Principle:
Principle #10Preliminary action

3Manufacturing precision

If complex curved figures are represented with many vertices, then manufacturing precision is improved, but device complexity increases

Engineering Contradiction:
Improvefigure representation accuracyVSAvoiddata structure complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent uses copying by referencing standard vertex sequence templates that can be reused multiple times across different figures. Instead of storing unique vertex data for each curved figure, the system copies references to standardized sequences from a library, simplifying the data structure while maintaining the ability to represent complex shapes through combinations of these standard patterns.

Inventive Principle:
Principle #26Copying

Data Source

PatentUS10971331B2Writing data generation method, computer-readable recording medium on which program is recorded, and multi-charged particle beam writing apparatus
Publication Date: 2021.04.06 NUFLARE TECH INC
  • US10971331B2 patent drawing
  • US10971331B2 patent drawing
  • US10971331B2 patent drawing

AI summary

In one embodiment, a writing data generation method is for generating writing data used by a multi-charged particle beam writing apparatus. The writing data generation method includes referring to library data in which a vertex sequence including a plurality of vertices is registered, and extracting a portion of an outer line of a figure contained in design data, the portion corresponding to the vertex sequence, and representing the extracted portion by information which identifies the vertex sequence and information which indicates a connection method for the plurality of vertices of the vertex sequence, and generating the writing data.