Writing Data Verification for Multi-Charged Particle Beam Apparatus

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Solution Overview

Problem

Conventional methods for detecting conversion errors in electron beam writing data from vector to pixel format are inadequate, as they cannot accurately distinguish between true and pseudo defects, leading to potential overlooks of true defects during data conversion in multi-beam writing apparatuses.

Innovation Solution

A writing data verification method that converts pixel writing data back to vector format, performs an exclusive OR operation, enlarges the original vector data graphic, generates a tolerance region graphic, and uses a mask process to detect and remove pseudo defects, ensuring accurate detection of conversion errors.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional XOR operation is performed on vector design data and pixel writing data, then conversion errors can be detected, but true defects cannot be distinguished from pseudo defects

Engineering Contradiction:
Improvedefect detection accuracyVSAvoiddefect differentiation reliability
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent segments the defect detection process into multiple stages: first performing XOR operation to identify potential defects, then separately analyzing each defect by comparing pixel data with vector data to distinguish true defects from pseudo defects. This segmentation allows accurate differentiation between defect types that would be indistinguishable in a single-step conventional approach.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent performs preliminary conversion of pixel writing data back to vector format before the XOR operation. This preliminary action creates a reference vector representation of the pixel data, enabling subsequent accurate comparison and differentiation between true defects and pseudo defects during the verification process.

Inventive Principle:
Principle #10Preliminary action

2Measurement precision

If pixel writing data is converted to vector format and XOR operation is performed, then conversion errors can be detected, but the process becomes complex

Engineering Contradiction:
Improveconversion error detection accuracyVSAvoiddata processing complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent creates a copy of the pixel writing data and converts it to vector format for comparison purposes. This copying approach allows the original pixel data to remain unchanged while enabling vector-based verification through XOR operation, maintaining detection accuracy without permanently complicating the data structure.

Inventive Principle:
Principle #26Copying

Solution Approach 2:

Instead of converting vector data to pixel format for comparison, the patent inverts the approach by converting pixel data back to vector format. This inversion enables direct vector-to-vector XOR comparison, simplifying the logical operation while maintaining high detection accuracy for conversion errors.

Inventive Principle:
Principle #13The other way round (Inversion)

Data Source

PatentUS9846760B2Writing data verification method and multi-charged particle beam writing apparatus
Publication Date: 2017.12.19 NUFLARE TECH INC
  • US9846760B2 patent drawing
  • US9846760B2 patent drawing
  • US9846760B2 patent drawing

AI summary

In one embodiment, a writing data verification method is for verifying a conversion error due to data conversion from first writing data in a vector format based on design data to second writing data in a pixel format. The method includes converting the second writing data to third writing data in a vector format, performing an exclusive OR operation on the first writing data and the third writing data, enlarging a graphic of the first writing data to obtain an enlarged graphic and generating a tolerance region graphic from a difference between the enlarged graphic and the graphic of the first writing data, and detecting a defect by performing a mask process on a graphic generated by the exclusive OR operation with the tolerance region graphic.