X-ray Condensing Method Using Phase Restoration
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Solution Overview
Problem
Current X-ray focusing systems lack a method for real-time evaluation of shape accuracy and absolute accuracy of X-ray mirrors, especially for high-energy hard X-rays, due to differences in measurement conditions between manufacturing and operational environments, and the inability to directly measure X-ray wavefront aberrations.
Innovation Solution
An X-ray condensing method using the phase restoration method to calculate wavefront aberrations from intensity distributions, allowing for real-time adjustment of X-ray focusing optical systems by controlling the reflective surface of mirrors with wavefront adjustable functions, such as shape-changeable or multilayer film mirrors, to minimize beam diameter and correct wavefront errors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional interferometric shape measurement methods are used to measure the focusing mirror surface, then measurement precision can reach nanometer level, but measurement time becomes excessively long and the measurement conditions differ from operational environment
Solution Approach 1:
The patent replaces the mechanical/optical interferometric measurement system with an X-ray based phase restoration method. By using X-ray intensity distribution measurements and computational phase restoration, the system eliminates the need for complex interferometric setups and lengthy measurement procedures, achieving rapid wavefront aberration evaluation under actual operational conditions.
Solution Approach 2:
The patent changes the measurement parameter from direct surface shape (using interferometry) to X-ray wavefront aberration (using phase restoration from intensity distributions). This parameter transformation allows measurement under operational X-ray conditions rather than requiring separate optical measurement setups, significantly reducing measurement time and environmental discrepancies.
2Manufacturing precision
If high accuracy focusing mirrors are manufactured using conventional processing methods, then diffraction-limited focusing can be achieved, but the mirrors cannot be adjusted for environmental changes during operation
Solution Approach 1:
The patent introduces dynamic adjustability to the focusing mirror system by enabling wavefront correction through phase restoration. The system can adaptively adjust the mirror surface or introduce compensating phase elements during operation to correct environmental deviations, transforming a static high-precision mirror into a dynamically adjustable focusing system.
Solution Approach 2:
The patent implements a feedback mechanism where X-ray intensity distributions are measured, phase restoration calculations determine wavefront aberrations, and corrective actions are applied to the focusing mirror. This closed-loop feedback system enables real-time compensation for environmental changes while maintaining diffraction-limited focusing performance.
3Measurement precision
If multiple measurement devices and complex processing procedures are used to evaluate mirror shape, then comprehensive accuracy assessment can be achieved, but device complexity and processing time increase significantly
Solution Approach 1:
The patent extracts only the essential information needed for accuracy assessment - the X-ray intensity distribution - and uses phase restoration to derive wavefront aberration directly from this single measurement. This eliminates the need for multiple specialized measurement devices and complex processing procedures, achieving comprehensive accuracy assessment with a simplified single-device approach.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise, real-time evaluation and correction of wavefront aberrations in X-ray focusing systems, achieving diffraction-limited focusing with improved accuracy and reliability, even in non-ideal operational environments, and is applicable to high-NA multilayer mirrors.
Implementation Method 1
a complex amplitude distribution on the reflective surface is calculated from an X-ray intensity distribution on a plane orthogonal to an optical axis in a vicinity of a focus and an X-ray intensity distribution on a plane orthogonal to the optical axis in a vicinity of the reflective surface of the X-ray mirror by a phase restoration method
Implementation Method 2
an X-ray is reflected and focused by a single or a plurality of X-ray mirrors having an ultraprecise reflective surface
Implementation Method 3
one of the X-ray mirrors has a wavefront adjustable function that enables a fine adjustment of a wavefront of the X-ray reflected by the reflective surface
Data Source
Figure 1
Figure 2
Figure 3(a)~3(c)
AI summary
An X-ray condensing method and its device are provided with an X-ray mirror that has a wavefront adjustable function to finely adjust a wavefront of a reflecting X-ray, measure an X-ray intensity distribution in the vicinity of a focus, measure an X-ray intensity distribution in the vicinity of the X-ray mirror or use a known X-ray intensity distribution of an incident X-ray, calculate a complex amplitude distribution at the reflective surface by using a phase restoration method from the X-ray intensity distribution in the vicinity of the focus and the X-ray intensity distribution in the vicinity of the reflective surface, calculate a wavefront aberration of an X-ray condensing optical system from the complex amplitude distribution, and control the reflective surface of the X-ray mirror with the wavefront adjustable function so that the wavefront aberration is minimized.