X-Ray Reflection Analysis With Diffraction-Split Beam Arrays
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Solution Overview
Problem
Contemporary X-ray measurement systems face challenges with prolonged measurement times and reduced accuracy due to mechanical repositioning and alignment for multi-point measurements, leading to inefficient and inaccurate analysis of small regions on a sample.
Innovation Solution
An X-ray reflection analysis system utilizing multiple X-ray beams, split by a diffraction component with unique microstructures, combined with sensors in a two-dimensional configuration, allowing simultaneous multi-point measurements without mechanical actuation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If mechanical repositioning and rotation mechanisms are used to align with desired micro-area measurement locations, then measurement positions can be changed, but measurement time becomes significantly prolonged and measurement accuracy is affected
Solution Approach 1:
The single X-ray beam is segmented into multiple sub-beams through a diffraction grating, allowing simultaneous measurement at multiple positions. Instead of moving a single beam to different locations sequentially, the beam is divided into multiple beams that can measure different micro-areas concurrently, eliminating mechanical repositioning time.
Solution Approach 2:
The patent replaces mechanical repositioning and rotation mechanisms with an optical diffraction-based beam splitting system. The diffraction grating creates multiple sub-beams at different angles without requiring any mechanical movement, substituting mechanical actuation with optical physics to achieve position flexibility without time loss.
2Adaptability or versatility
If mechanical repositioning and rotation mechanisms are used to align with desired micro-area measurement locations, then measurement positions can be changed, but measurement accuracy is affected due to introduced uncertainties
Solution Approach 1:
The patent eliminates mechanical repositioning and rotation mechanisms entirely, replacing them with a diffraction-based optical system. This substitution removes the sources of mechanical uncertainty and alignment errors, thereby maintaining or improving measurement accuracy while achieving position flexibility through beam splitting.
Solution Approach 2:
Instead of moving the beam to different positions (traditional approach), the patent inverts the approach by keeping the beam stationary and creating multiple virtual beam paths through diffraction. This inversion eliminates the need for mechanical movement and its associated accuracy issues.
3Measurement precision
If extended integration times are used to obtain data with sufficient resolution for small region analysis, then signal intensity is sufficient, but measurement time becomes prolonged
Solution Approach 1:
The measurement process is segmented into multiple simultaneous measurements using divided X-ray beams. Instead of one long integration time for one position, multiple shorter integration times occur concurrently at different positions, reducing total measurement time while maintaining signal resolution through parallel data collection.
Solution Approach 2:
The patent enables continuous useful action by performing multiple measurements simultaneously without interruption. While traditional systems must sequentially move and measure at each position (interrupted action), the diffraction-based system continuously measures multiple positions at once, maximizing measurement efficiency and reducing total time.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Significantly reduces overall measurement time and improves accuracy by enabling simultaneous multi-area analysis, eliminating the need for mechanical repositioning and alignment.
Implementation Method 1
The diffraction component is configured to split the primary X-ray beam into a plurality of sub X-ray beams in a matrix form
Data Source
AI summary
An X-ray reflection analysis system applying multiple X-ray beams is provided. The X-ray reflection analysis system includes at least one X-ray source device, a diffraction component, at least one sensor, and a processing device. At least one X-ray source device is configured to generate a primary X-ray beam. The diffraction component is configured to split the primary X-ray beam into a plurality of sub X-ray beams in a matrix form. The at least one sensor is configured to receive a plurality of sensing signals respectively generated after a to-be-measured object is irradiated by the sub X-ray beams. The processing device is configured to control the X-ray source device to generate the primary X-ray beam and to analyze the plurality of sensing signals to generate a plurality of analysis results.