X-ray Tube Insulator Coating via Plasma Deposition

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Solution Overview

Problem

Existing x-ray tube insulators face electrical charge buildup due to backscattered electrons, leading to arcing and failure, and current conductive dissipative coatings require high-temperature sintering processes that complicate application and can damage the bond between insulators and supports.

Innovation Solution

A method using vapor deposition to apply a conductive dissipative coating to x-ray tube insulators after they have been joined to supports, allowing for simultaneous application to multiple insulators and avoiding high-temperature processes that could damage the bond.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a conductive dissipative coating is applied using traditional sintering process, then the coating can be formed on the insulator, but the high temperature (above 1500°C) damages the bond between insulator and support components

Engineering Contradiction:
Improvecoating formationVSAvoidbond strength between insulator and support
Core Design Contradiction:
ReliabilityVSStrength

Solution Approach 1:

The patent changes the temperature parameter from traditional sintering (above 1500°C) to plasma processing (lower temperature), allowing conductive coating formation without damaging the insulator-support bond. This parameter change resolves the contradiction between forming a reliable coating and preserving bond strength.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent replaces the thermal sintering process with a plasma-based process. The plasma process uses ionized gas to deposit or modify the conductive coating without requiring high temperatures, thus substituting a thermal mechanism with a plasma mechanism that achieves the same coating function without the harmful thermal effects.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Ease of manufacture

If spraying or brushing process is used to apply conductive coating, then the coating can be applied to individual insulators, but the process cannot be batch processed and is difficult to control accurately

Engineering Contradiction:
Improvecoating applicationVSAvoidbatch processing capability
Core Design Contradiction:
Ease of manufactureVSProductivity

Solution Approach 1:

The plasma processing system is designed to handle multiple insulators simultaneously in a batch process, making the coating application universally applicable to single or multiple components. This increases productivity while maintaining precise control over the coating process through plasma parameter regulation.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Device complexity

If conductive coating is applied before brazing, then the coating process is simpler, but the high temperature sintering melts the filler metal of the brazing process

Engineering Contradiction:
Improvecoating process sequenceVSAvoidbrazing joint integrity
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent applies the conductive coating after brazing is completed, reversing the traditional sequence. The insulator is first brazed to supports at appropriate temperatures, then the conductive coating is applied using low-temperature plasma processing. This preliminary brazing followed by coating approach prevents filler metal melting while maintaining both joint integrity and coating quality.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The vapor deposition process effectively reduces electrical charge buildup on insulators without weakening the bond between insulators and supports, enabling efficient and controlled application of conductive coatings to prevent arcing and extend the lifespan of x-ray tubes.

Implementation Method 1

applying a first layer of a conductive dissipative coating to a surface of the insulator using a vapor deposition process

Methodology Applied
Scientific EffectVapor deposition: Physical Vapour Deposition

Data Source

PatentUS11257652B2Insulator with conductive dissipative coating
Publication Date: 2022.02.22 RICHARDSON ELECTRONICS LTD
  • US11257652B2 patent drawing
  • US11257652B2 patent drawing
  • US11257652B2 patent drawing

AI summary

Embodiments of the invention provide a conductive coating on an insulator of an x-ray tube and a method for applying the conductive coating. The method may use a first process, such as brazing, to join a support to the insulator and a second process, such as vapor deposition, to apply the conductive coating onto a substrate surface of the insulator. The second process may be carried out after the first process without any damage to x-ray tube insulator assembly.