X-ray Scattering Analysis Fusing Adjacent Mesh Layers
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Solution Overview
Problem
Current technologies face challenges in reducing the time required to analyze the scattering intensity distribution of X-rays, particularly when dealing with complex structures represented by rectangular parallelepiped meshes.
Innovation Solution
An analysis device and method that fuse adjacent layers with matching electron density patterns into a single fused layer, reducing the number of layers and thereby decreasing the time needed to determine the scattering intensity distribution of X-rays.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If traditional methods are used to analyze scattering intensity distribution of X-rays on complex mesh structures, then measurement precision is maintained, but analysis time becomes excessively long
Solution Approach 1:
The patent segments the complex mesh structure into multiple layers along the X-ray incident direction. Each layer is processed independently to calculate scattering intensity, allowing parallel computation and reducing overall analysis time while maintaining measurement precision through systematic layer-by-layer evaluation
Solution Approach 2:
The patent performs preliminary classification of mesh elements into discrete layers before the actual scattering calculation. This pre-processing step organizes the complex structure in advance, enabling more efficient computation during the scattering intensity determination phase without compromising accuracy
2Manufacturing precision
If the number of layers in mesh data is increased to improve resolution, then manufacturing precision is improved, but device complexity and processing time increase
Solution Approach 1:
The patent divides the structure into a finite number of discrete layers with manageable complexity. This segmentation approach maintains sufficient resolution for accurate scattering analysis while avoiding the computational burden of excessively fine segmentation, thus balancing manufacturing precision with device complexity
Solution Approach 2:
The patent optimizes the layer thickness parameter to achieve an optimal balance between resolution and computational efficiency. By carefully selecting the layer division parameter, the system maintains adequate manufacturing precision while keeping the number of layers at a manageable level for processing
Data Source
AI summary
An analysis device includes at least one processor, and memory storing instructions that, when executed by the at least one processor, cause the analysis device to, based on electron density patterns of a plurality of adjacent layers matching each other in orthogonal mesh data of a plurality of first layers divided in a first direction, fuse the plurality of adjacent layers into a fused layer and determine layer information about the fused layer, and based on the layer information about the fused layer, determine a scattering intensity distribution of X-rays incident in the first direction on a target structure that is represented by the orthogonal mesh data.