X-ray Scattering Device Reflection Geometry
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Solution Overview
Problem
Existing X-ray scattering measurement devices are not suitable for high-resolution microstructural measurements on sample surfaces, as they extend the spot size during X-ray irradiation, reducing resolution and making it difficult to measure nanostructures effectively, especially in laboratory settings without the quality of data obtained from synchrotron sources.
Innovation Solution
An X-ray scattering measurement device with a configuration that includes a first mirror focusing X-rays onto a two-dimensional detector within a plane parallel to the sample surface and a second mirror focusing X-rays onto the sample surface within a plane perpendicular to it, allowing for high-resolution measurements by minimizing spot size extension and utilizing diffraction for accurate microstructural analysis.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If existing X-ray scattering measurement devices pass X-rays through the sample to improve detector resolution, then the resolution of the detector is improved, but the spot size is extended in the X-ray irradiation direction, reducing the resolution on the detector and making the device unsuitable for microstructural measurement on the sample surface
Solution Approach 1:
Instead of passing X-rays through the sample (transmission geometry), the invention uses reflection geometry where X-rays are reflected off the sample surface. The optical system is inverted to focus X-rays onto the sample surface rather than through it, preventing spot size extension while maintaining detector resolution for surface microstructure measurement
Solution Approach 2:
The invention introduces a two-dimensional detector to capture scattering patterns in multiple dimensions simultaneously. By adding the dimension of surface reflection measurement rather than transmission, the system achieves high resolution for surface microstructures without the spot size extension problem
2Device complexity
If a single mirror is used to focus X-rays onto the sample, then the focusing capability is simplified, but the spot size is extended on the detector, preventing desired resolution from being obtained
Solution Approach 1:
The optical system is segmented into two separate mirrors with distinct functions: the first mirror focuses X-rays in the horizontal direction, and the second mirror focuses X-rays in the vertical direction. This segmentation allows independent optimization of each mirror's focusing capability, achieving a small spot size on the detector without excessive system complexity
Solution Approach 2:
The invention transitions from single-plane focusing to two-plane focusing by introducing a second mirror. The first mirror handles focusing in one dimension (horizontal), and the second mirror handles the perpendicular dimension (vertical), achieving comprehensive spot size control that a single mirror cannot provide
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high-resolution measurement of microstructures on sample surfaces, including semiconductor devices and magnetic recording media, with the ability to perform atomic-level measurements without wavelength limitations, and obtain comparable data to synchrotron sources in laboratory settings, allowing for immediate evaluation post-fabrication without damaging the sample.
Implementation Method 1
a first mirror that reflects the generated X-ray
Implementation Method 2
the first mirror focuses the generated X-ray onto the two-dimensional detector
Implementation Method 3
a second mirror that reflects the X-ray reflected by the first mirror
Implementation Method 4
the second mirror focuses the X-ray reflected by the first mirror onto the surface of the sample
Implementation Method 5
a two-dimensional detector that detects the X-ray scattered on the surface of the sample
Data Source
AI summary
A X-ray scattering measurement device and measurement method can measure, with high resolution, the intensity of X-rays which have undergone small-angle scattering and diffraction with reflection geometry and can easily and accurately measure a microstructure on the surface of a sample. The X-ray scattering measurement device is suitable for microstructural measurement on the surface of a sample includes an X-ray source that generates an X-ray; a first mirror and a second mirror that continuously reflect the generated X-ray; a sample stage that supports the sample; and a two-dimensional detector that detects the X-ray scattered on the surface of the sample. The first mirror focuses the generated X-ray onto the two-dimensional detector within a plane parallel to the surface of the sample, and the second mirror focuses the X-ray reflected by the first mirror onto the surface of the sample within a plane perpendicular to the surface of the sample.