X-ray Scattering Tilt Analysis for Columnar Structures

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current methods for measuring the tilt of columnar scattering bodies in plate-shaped samples are either time-consuming and inaccurate or quick but lack precision, especially when analyzing complex shapes in semiconductor inspection processes.

Innovation Solution

An analysis apparatus and method that performs coordinate conversion of scattering intensity data from X-ray measurements to calculate the tilt of columnar scattering bodies using specific diffraction points, allowing for high-speed and accurate measurement of two-directional components without relying on complex shape models.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a complex shape model is used for analysis, then measurement accuracy is improved, but measurement time increases significantly

Engineering Contradiction:
Improvetilt measurement accuracyVSAvoidmeasurement time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent extracts only the essential information needed for tilt measurement from the scattering data by focusing on specific diffraction points and their intensity relationships, rather than performing complete shape analysis. This selective extraction of critical parameters enables rapid tilt measurement without the time-consuming complex shape modeling process.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent segments the analysis into distinct components: identifying specific diffraction points, calculating intensity ratios, and determining tilt angles. By dividing the measurement process into these modular steps, the system achieves rapid tilt measurement independent of complex shape analysis, resolving the time-accuracy tradeoff.

Inventive Principle:
Principle #1Segmentation

2Productivity

If a simple shape model is used for analysis, then measurement time is reduced, but measurement accuracy deteriorates

Engineering Contradiction:
Improvemeasurement speedVSAvoidtilt measurement accuracy
Core Design Contradiction:
ProductivityVSMeasurement precision

Solution Approach 1:

The patent changes the analysis parameter from complete shape reconstruction to specific intensity ratio measurements at selected diffraction points. This parameter transformation enables simple, rapid analysis that maintains high tilt measurement accuracy by focusing on the critical intensity relationships that directly indicate tilt angle.

Inventive Principle:
Principle #35Parameter changes

3Adaptability or versatility

If two-direction scanning is performed without shape model, then adaptability is improved, but measurement time increases and accuracy is insufficient

Engineering Contradiction:
Improvemeasurement method flexibilityVSAvoidanalysis time
Core Design Contradiction:
Adaptability or versatilityVSLoss of time

Solution Approach 1:

The patent performs preliminary identification of specific diffraction points and establishes intensity ratio relationships before actual tilt measurement. This preparatory work creates a streamlined analysis pathway that maintains adaptability to different sample types while enabling rapid tilt determination without time-consuming iterative shape modeling.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables rapid and precise measurement of the tilt of columnar scattering bodies, improving the efficiency and accuracy of semiconductor inspection processes by leveraging single and loop analysis techniques to determine tilt angles with high accuracy.

Implementation Method 1

data of a scattering intensity from the plate-shaped sample measured by transmission of X-rays

Methodology Applied
Scientific EffectX-ray transmission and scattering: X-Ray

Implementation Method 2

intensity of a specific diffraction point

Methodology Applied
Scientific EffectDiffraction: Diffraction

Data Source

PatentUS20240319121A1Analysis apparatus, analysis method, and analysis program
Publication Date: 2024.09.26 RIGAKU CORP
  • US20240319121A1 patent drawing
  • US20240319121A1 patent drawing
  • US20240319121A1 patent drawing

AI summary

An analysis apparatus includes processing circuitry configured to store data of a scattering intensity measured by transmission of X-rays in one ω scan, perform coordinate conversion from the coordinate of the scattering vector to the coordinate of the tilt of the scattering body, with respect to a waveform based on the intensity of a specific diffraction point on the two-direction components, specify a peak position of the waveform of the intensity with respect to the coordinate of the tilt applied the coordinate conversion, and calculate a difference between the specified peak position and the peak position obtained on the assumption that the scattering body is not tilted from the direction perpendicular to the surface of the plate-shaped sample.