X-ray Scatterometry Asymmetry Correction for High Aspect Ratio Features

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Solution Overview

Problem

X-ray scatterometry techniques face challenges in accurately measuring high aspect ratio features in semiconductor devices due to undesired reflections from sidewalls, causing asymmetry in the measured X-ray intensity distribution, which degrades measurement quality.

Innovation Solution

The method involves correcting the X-ray distribution by averaging intensities on either side of the reference axis or selecting the orientation with the lowest asymmetry, and applying an asymmetric correcting function to reduce asymmetry, thereby improving measurement accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional X-ray scatterometry is used to measure high aspect ratio features, then measurement capability is provided, but asymmetry in intensity distribution degrades measurement precision

Engineering Contradiction:
Improvemeasurement precisionVSAvoidasymmetry in intensity distribution
Core Design Contradiction:
Measurement precisionVSObject-generated harmful factors

Solution Approach 1:

The patent converts the harmful asymmetry caused by sidewall reflections into a beneficial measurement signal. By intentionally introducing a known asymmetric element (beam stopper) and measuring its effect, the system transforms the problematic asymmetry into a useful reference for calibration and correction, thereby improving measurement precision of high aspect ratio features

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Solution Approach 2:

The patent changes the parameter of beam intensity distribution by introducing a beam stopper that creates a controlled asymmetric attenuation. This parameter change allows the system to characterize and correct the asymmetry in the scattering pattern, leading to improved measurement accuracy

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If beam stopper is introduced to correct asymmetry, then measurement accuracy is improved, but device complexity increases

Engineering Contradiction:
Improvemeasurement accuracyVSAvoiddevice complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The beam stopper is a simple, inexpensive component that can be easily positioned and removed. Rather than implementing a complex real-time correction system, the patent uses this simple disposable-like element to correct asymmetry, minimizing device complexity while improving measurement accuracy

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables accurate measurement of high aspect ratio features by reducing asymmetry caused by undesired reflections, leading to precise determination of geometrical parameters such as feature dimensions and distances.

Implementation Method 1

receiving a first distribution of an X-ray beam scattered from a sample

Methodology Applied
Scientific EffectX-ray scattering: Scattering

Data Source

PatentUS11169099B2Method and apparatus for X-ray scatterometry
Publication Date: 2021.11.09 BRUKER TECH LTD
  • US11169099B2 patent drawing
  • US11169099B2 patent drawing
  • US11169099B2 patent drawing

AI summary

A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.