X-ray Spectrometer Thin Film Thickness Calculation
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Solution Overview
Problem
Existing vapor phase decomposition methods require time-consuming and experience-dependent setting of conditions, making it difficult for inexperienced engineers to accurately determine vapor phase decomposition parameters for substrates with thin films, such as silicon substrates with oxide films.
Innovation Solution
An X-ray analysis system comprising an X-ray spectrometer and a vapor phase decomposition apparatus that calculates film thickness and coating mass from X-ray intensities, determining and correcting vapor phase decomposition time based on these calculations, allowing for preset relationships to be stored and applied for efficient decomposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If vapor phase decomposition conditions are determined through experimental methods based on skilled engineer's experience and intuition, then the decomposition conditions can be optimized for specific samples, but the analysis time increases significantly and inexperienced engineers cannot appropriately set the conditions
Solution Approach 1:
The patent replaces the manual experimental method (mechanical/system of trial-and-error based on engineer experience) with an automated calculation system using X-ray reflectivity measurements. The calculation unit automatically computes film thickness and determines optimal vapor phase decomposition time based on measured X-ray intensity data, eliminating the need for experienced engineers to perform time-consuming experiments while maintaining accurate decomposition condition determination
Solution Approach 2:
The system enables self-service operation where the calculation unit automatically determines vapor phase decomposition conditions by processing X-ray reflectivity data without requiring human intervention or expert knowledge. The apparatus autonomously calculates film thickness from measured intensities and derives appropriate decomposition parameters, allowing inexperienced operators to obtain accurate results without training
2Measurement precision
If experiments are performed in advance to determine vapor phase decomposition conditions, then accurate decomposition parameters can be obtained, but much time for analysis is required
Solution Approach 1:
The patent performs preliminary measurement of X-ray reflectivity intensities before the vapor phase decomposition process. By measuring the intensities of reflected X-rays at different incident angles and calculating film thickness in advance, the system determines the optimal decomposition time beforehand, eliminating the need for time-consuming trial experiments while ensuring accurate decomposition conditions are established prior to the actual analysis
3Ease of operation
If skilled engineer's experience and intuition are used to set vapor phase decomposition conditions, then appropriate parameters can be determined, but inexperienced engineers cannot appropriately set the conditions
Solution Approach 1:
The patent replaces the dependency on human expert judgment (skilled engineer's experience and intuition) with an automated calculation system. The calculation unit processes X-ray reflectivity data and automatically determines accurate vapor phase decomposition conditions, ensuring consistent and precise results regardless of the operator's experience level, thereby making the system equally effective for both experienced and inexperienced engineers
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables easy and accurate setting of vapor phase decomposition conditions, reducing analysis time and improving efficiency even for inexperienced operators by using calculated film thickness and coating mass to determine appropriate decomposition times.
Implementation Method 1
an X-ray source configured to irradiate a measurement sample having a thin film present on a surface of the measurement sample with primary X-rays
Implementation Method 2
an intensity of fluorescent X-rays generated by the primary X-rays
Implementation Method 3
an intensity of reflected X-rays obtained when the primary X-rays are reflected by the surface or an interface of the measurement sample
Implementation Method 4
a vapor phase decomposition portion configured to perform vapor phase decomposition on the thin film
Data Source
Figure 1(a)~1(b)
Figure 2
Figure 3
AI summary
Provided is an X-ray analysis system with which it is possible to set appropriate conditions for vapor phase decomposition with ease. The X-ray analysis system includes an X-ray spectrometer and a vapor phase decomposition apparatus. The X-ray spectrometer includes: an X-ray source configured to irradiate a measurement sample having a thin film present on its surface with primary X-rays; a detector configured to measure an intensity of reflected X-rays obtained when the primary X-rays are reflected by the surface or an interface of the measurement sample, or an intensity of fluorescent X-rays generated by the primary X-rays; and a calculation unit configured to calculate a film thickness or a coating mass of the thin film based on the intensity of the reflected X-rays or the fluorescent X-rays. The vapor phase decomposition apparatus includes: a vapor phase decomposition portion configured to perform vapor phase decomposition on the thin film; and a control portion configured to determine a vapor phase decomposition time based on the film thickness or the coating mass calculated by the calculation unit.