X-ray Analysis Apparatus Surface Integral Calculation

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Solution Overview

Problem

Existing technologies require an unreasonably long time to analyze the scattering intensity distribution of X-rays, especially when dealing with complex structures represented by rectangular parallelepiped mesh data.

Innovation Solution

An analysis device and method that extract information about electron density differences and surface elements at different material interfaces within a target structure, and calculate a surface integral to determine the scattering intensity distribution of X-rays, thereby reducing the time required for analysis.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If traditional volume integral methods are used to calculate scattering intensity distribution, then measurement precision is maintained, but analysis time becomes unreasonably long

Engineering Contradiction:
Improvescattering intensity distribution accuracyVSAvoidanalysis time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent extracts and utilizes only the surface elements at different material interfaces rather than processing the entire volume. By identifying and isolating the critical surface regions where scattering occurs, the method eliminates unnecessary volume calculations while preserving measurement precision.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent transitions from three-dimensional volume integral calculations to two-dimensional surface element processing. By converting the problem from volumetric integration to surface integration, the computational complexity is reduced from O(V) to O(S), achieving significant speedup while maintaining accuracy.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Measurement precision

If detailed mesh data processing is performed, then measurement precision is improved, but device complexity increases

Engineering Contradiction:
Improveinterface analysis accuracyVSAvoiddata processing complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent segments the mesh data processing into distinct stages: first extracting surface elements at material interfaces, then calculating electron density differences only at these interfaces. This segmentation allows detailed processing where needed while avoiding unnecessary complexity in other regions.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent applies high-precision calculations locally at different material interfaces rather than uniformly across the entire structure. By concentrating computational resources on the interfaces where scattering occurs, the method achieves high measurement precision without requiring complex processing throughout the entire volume.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The proposed solution significantly reduces the time needed to calculate the scattering intensity distribution, achieving a speedup of 5514.4 times compared to traditional methods, while maintaining accurate results.

Implementation Method 1

calculating a scattering intensity distribution of X-rays irradiated to the target structure based on the surface integral that was calculated

Methodology Applied
Scientific EffectX-ray scattering: Scattering

Data Source

PatentUS20250155386A1X-ray analysis apparatus, analysis method, and computer program product
Publication Date: 2025.05.15 SAMSUNG ELECTRONICS CO LTD
  • US20250155386A1 patent drawing
  • US20250155386A1 patent drawing
  • US20250155386A1 patent drawing

AI summary

An analysis device, an analysis method, and a computer program product that are configured to reduce an amount of time required to analyze scattering intensity distribution of X-rays are provided. An analysis device according to example embodiments includes an extraction circuit configured to extract information about an electron density difference at a different material interface included in a target structure and information about a surface element included at the different material interface from data representing the target structure, and a calculation circuit configured to calculate a surface integral at the different material interface based on the information about the electron density difference and the information about the surface element, and to calculate a scattering intensity distribution of X-rays irradiated to the target structure based on the surface integral.