X-Ray Target Irradiation Switching for Resolution and Imaging Speed
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Solution Overview
Problem
Existing X-ray imaging systems face challenges in easily changing X-ray imaging characteristics such as spatial resolution and imaging time based on the object's purpose and type, necessitating complex adjustments to the X-ray generation device.
Innovation Solution
An X-ray generation device with an irradiation area switching unit that adjusts the area of the X-ray generation target irradiated by the electron beam between different areas, allowing for simple switching between two X-ray imaging modes with distinct characteristics.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the X-ray generation device uses a fixed irradiation area on the target, then the device structure is simple, but the X-ray imaging characteristics cannot be changed according to different imaging requirements
Solution Approach 1:
The X-ray generation target is divided into multiple target parts (first target part and second target part) with different characteristics. By selectively irradiating different target parts, the system can switch between different X-ray imaging modes (Talbot interferometer and Talbot-Lau interferometer) without changing the overall device structure, thus improving adaptability while maintaining structural simplicity.
Solution Approach 2:
The electron beam irradiation area is made dynamically adjustable by controlling the electron beam position and size. The irradiation area switching unit enables dynamic switching between irradiating the first target part (for high spatial resolution) and the second target part (for short imaging time), allowing the system to adapt to different imaging requirements in real-time.
2Reliability
If multiple X-ray imaging modes are implemented using different X-ray generation devices, then each imaging mode can be optimized, but the system complexity and difficulty of switching between modes increases
Solution Approach 1:
The X-ray generation device is designed with multi-functionality by incorporating multiple target parts that can serve different imaging modes. A single device can perform both Talbot interferometer imaging (using the first target part) and Talbot-Lau interferometer imaging (using the second target part), eliminating the need for multiple separate devices and simplifying the overall system while maintaining optimized performance for each mode.
3Productivity
If the electron beam irradiates a larger area of the target, then more X-rays are generated for faster imaging, but the spatial resolution decreases
Solution Approach 1:
Different target parts are designed with different local qualities suitable for different imaging priorities. The first target part is optimized for high spatial resolution with a smaller irradiation area, while the second target part is optimized for fast imaging with a larger irradiation area. The system selects the appropriate target part based on the imaging requirements, ensuring optimal local quality for each specific application.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables easy switching between X-ray imaging modes with different characteristics, such as Talbot interferometer and Talbot-Lau interferometer systems, by controlling the number and area of target parts irradiated with the electron beam.
Implementation Method 1
an electron gun emitting an electron beam
Implementation Method 2
an X-ray generation target including a plurality of target parts generating X-rays in response to incidence of the electron beam
Data Source
AI summary
An X-ray generation device includes an electron gun emitting an electron beam, an X-ray generation target including a plurality of target parts generating X-rays in response to incidence of the electron beam from the electron gun, and an irradiation area switching unit switching an area of the X-ray generation target irradiated with the electron beam between a first irradiation area and a second irradiation area. The number of target parts included in the first irradiation area is larger than the number of target parts included in the second irradiation area. An area of the target parts included in the first irradiation area is larger than an area of the target parts included in the second irradiation area.