X-Ray Target Thickness Tuning Across Accelerating Voltages
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional X-ray generating apparatuses face limitations in adjusting the target thickness to accommodate varying accelerating voltages, leading to suboptimal X-ray generation due to individual differences in processing and assembly tolerances, requiring specialized configurations or adjustments to accurately position the electron beam.
Innovation Solution
An X-ray generating apparatus with a controller that operates in two modes: a thinning mode to adjust the target thickness by irradiating it with an electron beam within a specific current range and a generating mode to produce X-rays with an electron beam within a different current range, using a deflector to adjust the electron beam's incident position and a target with varying thicknesses at concave portions corresponding to different accelerating voltages.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a single target with fixed thickness is used, then the device structure is simple, but the range of accelerating voltages is limited
Solution Approach 1:
The target is designed with non-uniform thickness distribution, creating different thickness regions (first thickness region and second thickness region) that correspond to different accelerating voltage ranges. This allows a single target to optimize X-ray generation for multiple voltage conditions without requiring multiple separate targets.
Solution Approach 2:
The electron beam incident position is dynamically adjusted based on the accelerating voltage being applied. The controller modifies the incident position to ensure the beam always strikes the appropriate thickness region of the target, enabling the system to adapt to varying voltage conditions with a single multi-region target.
2Productivity
If the target thickness is increased to maximize X-ray dose, then X-ray generation efficiency improves, but X-ray attenuation increases
Solution Approach 1:
The target incorporates regions with different thicknesses optimized for different purposes. The first thickness region is designed to maximize X-ray dose for lower accelerating voltages, while the second thickness region is optimized to reduce attenuation for higher accelerating voltages, allowing the system to achieve optimal performance across different operating conditions.
3Ease of manufacture
If conventional thin metal film targets are used, then X-ray generation is possible, but precise beam alignment is difficult due to processing and assembly tolerances
Solution Approach 1:
By creating distinct thickness regions with different physical characteristics on the target, the system provides inherent visual and physical markers that facilitate easier alignment. The non-uniform thickness pattern serves as a reference that compensates for tolerances in processing and assembly, reducing the difficulty of achieving precise beam positioning.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for efficient X-ray generation across a range of accelerating voltages by optimizing the target thickness for each voltage, eliminating the need for precise beam alignment and enabling flexible operation without requiring additional adjustment steps.
Implementation Method 1
an electron beam generated at the cathode is accelerated by an accelerating voltage and irradiates the target
Implementation Method 2
The electron beam generated at the cathode is accelerated by an accelerating voltage
Implementation Method 3
a target is irradiated with an electron beam to emit X-rays from the target
Implementation Method 4
irradiating the target with an electron beam to emit X-rays from the target
Implementation Method 5
a deflector that deflects the electron beam
Implementation Method 6
If the target is thinner than the optimal thickness, part of an electron beam is transmitted through the target
Implementation Method 7
if the target is thicker than the optimal thickness, generated X-rays are attenuated when transmitted through the target
Data Source
AI summary
An X-ray generating apparatus includes an electron gun, a target configured to generate X-rays by being irradiated with an electron beam emitted from the electron gun, and a controller configured to control a first mode for thinning the target by irradiating the target with an electron beam with a current adjusted within a first current range and a second mode for generating X-rays by irradiating the target with an electron beam with a current adjusted within a second current range. The first current range has a lower limit larger than an upper limit of the second current range.