Yttrium Doped Quartz Ring for Plasma Erosion Resistance
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Solution Overview
Problem
Chamber components in plasma processing systems are prone to corrosion and erosion, leading to inconsistent processing results and contamination of substrates, necessitating frequent replacement and increased maintenance costs.
Innovation Solution
Fabrication of yttrium doped quartz components with aluminum and nitrogen dopants, which provide enhanced corrosion resistance and are suitable for use in corrosive plasma environments, including cover rings and substrate support pedestals, using a method that involves blending quartz with yttrium and aluminum materials, heating, and forming into annular bodies to circumscribe substrate support pedestals.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional quartz components are used in plasma chambers, then the chamber can operate, but the components suffer from corrosion and erosion leading to frequent replacement
Solution Approach 1:
The patent applies composite materials by doping quartz with yttrium (forming yttrium-doped quartz) to create a material with enhanced plasma resistance. The composite structure combines the base quartz matrix with yttrium dopant atoms, where the yttrium atoms substitute for silicon atoms in the quartz lattice, creating a composite material that resists plasma corrosion and erosion while maintaining the structural properties of quartz.
2Object-affected harmful factors
If chamber components are replaced frequently due to erosion, then contamination is reduced, but maintenance costs and downtime increase
Solution Approach 1:
The patent applies preliminary action by pre-doping the quartz components with yttrium during the manufacturing process, so that the components are prepared in advance with enhanced plasma resistance. This preliminary doping action ensures that when the components are installed in the plasma chamber, they are already protected against corrosion and erosion, eliminating the need for frequent replacements and reducing maintenance downtime.
3Reliability
If yttrium doping concentration is increased to improve plasma resistance, then corrosion resistance improves, but manufacturing complexity increases
Solution Approach 1:
The patent applies parameter changes by optimizing the yttrium doping concentration to achieve the desired plasma resistance while maintaining manufacturability. By carefully controlling the yttrium content parameter in the quartz material, the patent achieves enhanced plasma resistance without excessive complexity in the doping process, finding an optimal balance between performance and manufacturing feasibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The yttrium doped quartz components exhibit improved corrosion resistance, extending their service life, reducing maintenance and manufacturing costs, and enhancing processing uniformity by modifying the plasma environment near the substrate.
Implementation Method 1
a quartz ring having an annular body adapted to circumscribe a substrate support pedestal and comprised of a material suitable for exposure to a corrosive plasma environment, wherein the quartz ring comprises yttrium and aluminum dopants less than about 5 percent by weight respectively
Implementation Method 2
heating the mixture, and forming a yttrium containing quartz component
Data Source
AI summary
A method of fabricating doped quartz component is provided herein. In one embodiment, the doped quartz component is a yttrium doped quartz ring configured to support a substrate. In another embodiment, the doped quartz component is a yttrium and aluminum doped cover ring. In yet another embodiment, the doped quartz component is a yttrium, aluminum and nitrogen containing cover ring.