Yttrium Fluoride Coating for Plasma Chamber Component Stability

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Solution Overview

Problem

Semiconductor processing chamber components face instability and reduced lifespan due to continuous attack from reactive species during plasma processing, leading to process drift, contamination, and frequent maintenance needs.

Innovation Solution

A chamber component with a yttria outer layer coated with a fluorine-rich yttrium fluoride or oxy-fluoride layer, formed using a wet coating process involving a fluorine-containing chemical and ammonium salt solution, providing a robust and plasma-resistant surface.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If chamber components are used in plasma processing environment, then substrate processing can be performed, but the components suffer continuous attack from reactive species leading to erosion, composition change, and reduced lifespan

Engineering Contradiction:

Improvesubstrate processing capabilityVSAvoidcomponent stability and lifespan

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The patent applies composite materials by coating chamber components with fluorinated layers (such as fluorinated silicon oxide or fluorinated rare earth oxide) over a base material (such as silicon oxide or rare earth oxide). This composite structure combines the structural integrity of the base material with the plasma resistance properties of the fluorinated coating, allowing the component to withstand continuous plasma exposure while maintaining processing capability

Inventive Principle:

Principle #40Composite materials

Solution Approach 2:

The patent changes the chemical composition parameters of the coating by introducing fluorine atoms into the oxide structure. This parameter change (adding fluorine) fundamentally alters the surface properties to be more resistant to plasma attack, while the coating process itself (chemical vapor deposition or atomic layer deposition) controls the thickness and density parameters to optimize protection

Inventive Principle:

Principle #35Parameter changes

2Productivity

If chamber components are exposed to plasma processing, then substrate manufacturing continues, but flakes from eroded parts cause particulate contamination

Engineering Contradiction:

Improvecontinuous substrate manufacturingVSAvoidparticulate contamination from eroded flakes

Core Design Contradiction:

ProductivityVSObject-generated harmful factors

Solution Approach 1:

The fluorinated composite coating prevents flake formation by creating a stable, adherent surface layer that does not erode into particulates. The fluorinated oxide structure maintains its integrity under plasma exposure, eliminating the source of contamination while allowing continuous manufacturing

Inventive Principle:

Principle #40Composite materials

Solution Approach 2:

The patent converts the potentially harmful interaction between plasma and chamber components into a beneficial outcome. By fluorinating the surface, the plasma that would normally cause erosion is instead used to maintain a stable, self-cleaning surface that prevents flake formation and particulate contamination

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

3Ease of operation

If chamber components are periodically cleaned with highly reactive fluorine, then processing by-products are removed, but the chemical composition becomes unstable and service frequency increases

Engineering Contradiction:

Improvecleaning capabilityVSAvoidcomponent service life

Core Design Contradiction:

Ease of operationVSDuration of action of stationary object

Solution Approach 1:

The fluorinated coating provides self-service by being inherently resistant to plasma attack and self-cleaning. The fluorinated surface prevents polymer buildup and by-product adhesion, eliminating or reducing the need for periodic aggressive cleaning cycles that would otherwise degrade the component

Inventive Principle:

Principle #25Self-service

Solution Approach 2:

The patent converts the harmful effect of reactive fluorine (which normally erodes components during cleaning) into a beneficial protective layer. The fluorinated coating is resistant to further fluorine attack, allowing cleaning to occur without damaging the component and extending service life

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The coating layer enhances the chamber component's resistance to corrosive plasma environments, reducing particle contamination, stabilizing etch rates, and extending the component's service life while maintaining product quality.

Implementation Method 1

reacting fluorine ions from the wet coating solution with yttria from the chamber component, and forming a coating layer that comprises a yttrium oxy-fluoride containing material

Methodology Applied

Scientific EffectChemical reaction: Chemical Bonding

Data Source

PatentUS10941303B2Chemical conversion of yttria into yttrium fluoride and yttrium oxyfluoride to develop pre-seasoned corossion resistive coating for plasma components

Publication Date: 2021.03.09 APPLIED MATERIALS INC

AI summary

Embodiments of the disclosure provide a chamber component for use in a plasma processing chamber apparatus. The chamber component may include a coating layer that provides a fluorine-rich surface. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes a body having an outer layer comprising yttria having a coating layer formed thereon, wherein the coating layer comprises a yttrium fluoride containing material.