Zero Dead Leg Valve Manifold for Semiconductor Precursor Delivery

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

In atomic layer deposition tools for semiconductor manufacturing, there is a challenge in preventing premature deposition of precursors within gas or fluid lines, which requires keeping them separate from each other to avoid unwanted reactions.

Innovation Solution

A valve manifold system is designed with specific configurations, including purge gas inlets, process gas interfaces, and flow paths with no dead legs, allowing for efficient delivery and separation of precursors while minimizing premature deposition by ensuring continuous flow and effective purging.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If precursors are kept separate in gas lines to prevent premature deposition, then deposition control is improved, but device complexity increases due to multiple separate flow paths and valve interfaces

Engineering Contradiction:

Improvedeposition controlVSAvoidmanifold structure

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The manifold body is segmented into multiple independent flow paths, each with dedicated valve interfaces (first valve interface, second valve interface, purge valve interface) that separate precursor gas streams. This segmentation allows precise control of each precursor while maintaining physical separation to prevent premature deposition.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The manifold body acts as an intermediary structure that receives multiple precursor gases through separate valve interfaces and delivers them to the process chamber through controlled flow paths. The purge gas interface serves as another intermediary to clean the flow paths between precursor deliveries.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Device complexity

If traditional manifold designs are used, then device simplicity is maintained, but purge volume and time increase due to dead legs in flow paths

Engineering Contradiction:

Improvemanifold designVSAvoidpurge time

Core Design Contradiction:

Device complexityVSLoss of time

Solution Approach 1:

The flow paths are designed without dead legs to enable preliminary purging of all gas volumes before precursor delivery. This ensures that no residual precursor remains in the flow paths, allowing rapid switching between precursors without extended purge times.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The manifold design maintains continuous flow paths from each valve interface through the body to the process chamber, eliminating stagnant zones. This continuous flow enables rapid purging and reduces the time required to switch between different precursor gases.

Inventive Principle:

Principle #20Continuity of useful action

Data Source

PatentUS8985152B2Point of use valve manifold for semiconductor fabrication equipment

Publication Date: 2015.03.24 NOVELLUS SYSTEMS INC

AI summary

A point-of-use valve (POU valve) manifold is provided that allows for multiple precursors to be delivered to a semiconductor processing chamber through a common outlet. The manifold may have a plurality of precursor inlets and a purge gas inlet. The manifold may be configured such that there are zero dead legs in the manifold when the purge gas is routed through the manifold, and may provide mounting location for the POU valves that alternate sides. One or more internal flow path volumes may include elbow features.