Zero Dead Volume Gas Supply System for Semiconductor Reactors
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Solution Overview
Problem
Shared gas supply systems for multiple-reactor semiconductor processing apparatuses face challenges with dead volume issues, leading to ineffective purging and unintended mixing of process gases, which complicates the selective supply of gases to individual reactors.
Innovation Solution
A zero dead volume gas supply system is implemented, featuring an annular gas distribution conduit with valved outlets and a controller to manage gas pulses, ensuring each reactor receives alternating pulses of process gases from dedicated sources, thereby eliminating dead volume and preventing gas mixing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a shared gas supply system is used for multiple reactors, then manufacturing and maintenance costs are reduced and space is saved, but dead volume accumulates in the system causing ineffective purging and unintended gas mixing
Solution Approach 1:
The gas supply system is segmented into multiple independent gas supply units, each dedicated to supplying process gas to a specific reactor. This segmentation eliminates dead volume accumulation by ensuring that each gas supply unit can be independently purged and controlled, preventing unintended gas mixing while maintaining system efficiency.
2Ease of operation
If flow control devices are provided for each individual reactor, then gas flow control is improved, but the system becomes unduly complicated and expensive
Solution Approach 1:
Each gas supply unit is designed as a universal module that can supply process gas to its designated reactor with precise flow control. The gas supply units incorporate integrated flow control mechanisms that allow precise regulation without requiring separate complex flow control devices for each reactor, maintaining operational precision while minimizing system complexity.
3Reliability
If process gases are supplied sequentially to reactors, then dead volume is reduced and gas mixing is prevented, but process time is increased
Solution Approach 1:
Multiple gas supply units operate simultaneously and independently, each supplying process gas to its designated reactor without interruption. This continuous operation eliminates the downtime associated with sequential gas supply while maintaining accurate gas distribution through dedicated supply paths that prevent mixing and minimize dead volume effects.
Data Source
AI summary
A semiconductor processing apparatus is described. The semiconductor processing apparatus includes a gas supply system. The gas supply system has at least one gas supply unit including a process gas source, a gas distribution manifold having an annular gas distribution conduit provided with an inlet and valved outlets; and a gas supply conduit fluidly connecting the process gas source to the inlet of the gas distribution manifold. The semiconductor processing apparatus also includes a plurality of reactors, each fluidly connected to a respective valved outlet of the gas distribution manifold, such that process gas from the process gas source of the at least one gas supply unit is selectively suppliable to a respective reactor via the gas supply conduit, the gas distribution manifold, and a respective valved outlet. A method of providing a plurality of reactors with process gas is also described.