Zigzag Opening Patterns via Block Copolymer Self-Assembly
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Solution Overview
Problem
The existing photolithography processes require multiple steps and increased manufacturing costs to form opening patterns in a zigzag configuration, as they necessitate three or more line-and-space pattern formation processes, which is complex and costly compared to forming grid configurations.
Innovation Solution
A pattern formation method involving the formation of guide layers, block copolymer layers, and microphase-separation to create a self-assembled layer that allows for the formation of openings in a zigzag configuration using only two photolithography and dry etching steps, reducing the number of manufacturing processes and costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If three or more line-and-space pattern formation processes are used to form zigzag configuration openings, then the opening pattern can be formed, but the manufacturing process becomes complicated and manufacturing costs increase
Solution Approach 1:
The patent segments the pattern formation process into two distinct guide layer formation steps instead of requiring three or more photolithography processes. The first guide layer establishes the initial line-and-space pattern, while the second guide layer introduces the phase shift to create the zigzag configuration. This segmentation reduces process complexity while maintaining the ability to form precise zigzag opening patterns.
Solution Approach 2:
The patent employs preliminary action by forming the first guide layer with a specific line-and-space pattern before introducing the second guide layer. This preliminary pattern serves as a foundation that, when combined with the second guide layer's phase-shifted pattern, automatically generates the zigzag configuration through self-alignment, eliminating the need for additional complex processing steps.
2Manufacturing precision
If three or more line-and-space pattern formation processes are used to form zigzag configuration openings, then the opening pattern can be formed, but manufacturing costs increase
Solution Approach 1:
By dividing the pattern formation into two guide layer steps rather than three or more photolithography processes, the patent reduces the number of expensive manufacturing operations required. Each guide layer formation is a standardized, cost-effective process, and their combination achieves the zigzag configuration without additional costly steps.
Solution Approach 2:
The patent utilizes self-service through self-aligned formation where the second guide layer automatically aligns with the first guide layer's pattern. This self-alignment mechanism eliminates the need for complex alignment procedures and additional processing steps, thereby reducing manufacturing costs while maintaining high precision in the zigzag opening pattern formation.
3Ease of manufacture
If conventional photolithography processes are used, then manufacturing processes are simple for grid configuration, but they cannot efficiently form zigzag configuration patterns
Solution Approach 1:
The patent applies universality by creating a multi-functional guide layer system that can form both grid and zigzag configurations. The first guide layer provides a universal line-and-space pattern foundation, while the second guide layer can be adjusted to produce either grid alignment (no phase shift) or zigzag configuration (with phase shift). This universal approach maintains process simplicity while enhancing adaptability to different pattern requirements.
Solution Approach 2:
The patent introduces dynamics through the adjustable phase relationship between the first and second guide layers. By varying the phase shift introduced by the second guide layer, the system can dynamically transition between forming grid configurations (zero phase shift) and zigzag configurations (non-zero phase shift). This dynamic capability allows a single standardized process to adapt to different pattern requirements without complicating the manufacturing steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the efficient formation of finer opening patterns in a zigzag configuration with reduced manufacturing processes and costs, while maintaining the ability to differentiate opening pitches, thereby improving manufacturing efficiency.
Implementation Method 1
forming a first layer and a second layer surrounded by the first layer in each of the first opening portion and the second opening portion by phase-separating the block copolymer layer
Data Source
AI summary
According to one embodiment, a pattern formation method includes: forming a first guide layer having of first openings exposing a surface of an underlayer, and the first openings being arranged in a first direction; forming a second guide layer on the underlayer and on the first guide layer, the second guide layer extending in the first direction, the second guide layer dividing each of the first openings into the first opening portion and the second opening portion, and the second guide layer being sandwiched by a first opening portion and a second opening portion; forming a block copolymer layer in each of the first opening portion and the second opening portion; forming a first layer and a second layer surrounded by the first layer in each of the first opening portion and the second opening portion by phase-separating the block copolymer layer; and removing the second layer.