Zigzag Phase Shift Mask for High Resolution TFT-LCD Fabrication
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Solution Overview
Problem
Current Phase Shift Masks (PSM) used in TFT-LCD fabrication only marginally increase resolution and are inadequate for higher resolution demands, limiting the display quality of flat panel displays.
Innovation Solution
A mask design featuring a substrate with opposing first and second exposure structures, each comprising light transmission and shielding film layers with zigzag structures, enhancing light interference and diffraction effects to concentrate light intensity, thereby increasing resolution and display quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional Phase Shift Masks are used, then fabrication process is simple, but resolution increase is marginal and insufficient for higher resolution demands
Solution Approach 1:
The patent applies zigzag (curved) structures to the side edges of exposure structures instead of straight lines. This curvature modifies light diffraction patterns to enhance resolution. Specifically, the zigzag structures on opposing exposure structures create controlled interference patterns that concentrate light intensity in desired areas, achieving higher resolution beyond what conventional flat masks can provide
Solution Approach 2:
The patent transitions from conventional two-dimensional planar mask structures to three-dimensional zigzag structures with multiple levels. The side edges of exposure structures are formed with zigzag patterns that extend in the vertical dimension, creating a multi-level structure that manipulates light paths more effectively to achieve superior resolution
2Manufacturing precision
If exposure structure size is reduced for higher pixel density, then pixel density increases, but light intensity becomes insufficient
Solution Approach 1:
The patent converts the potentially harmful diffraction effects that occur with small exposure structures into beneficial concentrated light patterns. By introducing zigzag structures, the diffraction that would normally scatter light is redirected to concentrate light intensity at specific points, enabling smaller exposure structures to maintain sufficient light intensity for high pixel density applications
Solution Approach 2:
The patent changes the geometric parameters of exposure structures by introducing zigzag patterns with specific dimensions. The zigzag structures have controlled tooth widths, depths, and spacing that are optimized to concentrate light intensity. This parameter modification allows smaller overall exposure structure sizes while maintaining or enhancing light intensity through the interference and diffraction effects of the zigzag geometry
3Illumination intensity
If zigzag structures are added to enhance light concentration, then light intensity is centralized, but manufacturing complexity increases
Solution Approach 1:
The patent segments the side edges of exposure structures into multiple zigzag units rather than using complex continuous curves. This segmentation into repeating triangular or trapezoidal patterns simplifies manufacturing by allowing standard fabrication processes to create the zigzag patterns through controlled etching or deposition, reducing overall manufacturing complexity while maintaining light concentration effectiveness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The mask design effectively centralizes light intensity, meeting smaller-size exposure demands and increasing the resolution and display quality of TFT-LCDs, enabling higher pixel density and narrower borders.
Implementation Method 1
enhancing light interference and diffraction effects to concentrate light intensity
Implementation Method 2
enhancing light interference and diffraction effects to concentrate light intensity
Data Source
AI summary
Disclosed are a mask, a display substrate and a display device. The mask comprises a substrate, a first exposure structure, a second exposure structure located at one side of the substrate and disposed opposite to each other, the first exposure structure comprises a first light transmission film layer and a first light shielding film layer, an orthographic projection of the first light shielding film layer falls within an orthographic projection of the first light transmission film layer on the substrate; the second exposure structure comprises a second light transmission film layer and a second light shielding film layer, an orthographic projection of the second light shielding film layer falls within an orthographic projection of the second light transmission film layer on the substrate; a side edge of the first exposure structure has a first zigzag structure, and a side edge of the second exposure structure has a second zigzag structure.