Zinc Oxide Etching Composition Using Organic Acids
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Solution Overview
Problem
Existing etching compositions for zinc oxide films in display devices suffer from inadequate accuracy, excessive residue formation, and unstable etching rates, leading to issues like leak currents and adhesion problems, particularly when using hydrochloric acid, nitric acid, or oxalic acid solutions.
Innovation Solution
An etching composition comprising organic carboxylic acid compounds such as acetic acid, succinic acid, and ammonium salts, combined with polysulfonic acid compounds like naphthalenesulfonic acid derivatives, and water, which maintains a stable etching rate and minimizes residue formation when etching zinc oxide films.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If hydrochloric acid or nitric acid is used as etching composition, then etching can be conducted, but side etching increases and accuracy decreases
Solution Approach 1:
The patent changes the chemical composition parameters of the etching solution by using organic carboxylic acids (acetic acid, propionic acid, butyric acid, and their mixtures) instead of conventional inorganic acids. This parameter change results in suppressed side etching and improved etching accuracy while maintaining effective zinc oxide removal.
2Productivity
If conventional acidic solutions are used for etching, then etching can proceed, but residues are formed on the substrate
Solution Approach 1:
The patent modifies the chemical parameters of the etching system by employing organic carboxylic acids with specific molecular structures and properties. This change eliminates residue formation while preserving etching efficiency, as the organic acids produce soluble zinc salts that can be easily removed from the substrate surface.
3Stability of the object's composition
If the etching composition is stable, then consistent etching rate is achieved, but zinc oxide dissolution changes concentration and affects stability
Solution Approach 1:
The patent implements a feedback mechanism where the etching process parameters are monitored and controlled to maintain composition stability. The use of organic carboxylic acids provides a buffer system that resists concentration changes, and the process is designed to maintain pH and composition within optimal ranges throughout etching, ensuring consistent etching rates.
4Productivity
If strong acids are used to increase etching rate, then productivity improves, but corrosion of wiring materials occurs
Solution Approach 1:
The patent changes the acidity parameter from strong inorganic acids to weaker organic carboxylic acids. This parameter change maintains sufficient etching rate for productivity while reducing the corrosive effect on aluminum and other wiring materials, as organic acids have lower corrosivity despite effective zinc oxide dissolution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves precise etching with reduced side etching and stable etching properties, preventing residue formation and ensuring consistent etching rates, making it suitable for industrial production of transparent electrodes.
Implementation Method 1
zinc oxide is soluble in acids and alkalis
Implementation Method 2
an etching composition which contains at least one organic carboxylic acid compound selected from acetic acid, propionic acid, butyric acid, succinic acid, citric acid, lactic acid, malic acid, tartaric acid, malonic acid, maleic acid, glutaric acid, aconitic acid, 1,2,3-propanetricarboxylic acid and ammonium salts of these acids, a polysulfonic acid compound
Data Source
AI summary
An etching composition which comprises at least one organic carboxylic acid compound selected from acetic acid, propionic acid, butyric acid, succinic acid, citric acid, lactic acid, malic acid, tartaric acid, malonic acid, maleic acid, glutaric acid, aconitic acid, 1,2,3-propanetricarboxylic acid and ammonium salts of these acids, a polysulfonic acid compound and water, and an etching process which comprises etching a conductive film comprising zinc oxide as the main component using the etching composition described above.