High Zinc Oxide Sputtering Target Strength
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Solution Overview
Problem
Sputtering targets with a composition region having a high amount of zinc tend to suffer from low transverse rupture strength, leading to issues such as breakage due to thermal strain, plasma radiation heat, and handling stress, which results in abnormal discharge and nodule generation during sputtering.
Innovation Solution
A sputtering target comprising an oxide sintered body with a composition of indium, tin, and zinc, including hexagonal layered, rutile, and spinel structure compounds, with specific atomic ratios and crystal structures to enhance strength and prevent abnormal discharge, formed through a method involving pulverization, mixing, granulation, and sintering at high temperatures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a sputtering target with high zinc content is used to reduce cost, then raw material cost is reduced, but transverse rupture strength becomes low leading to breakage and abnormal discharge
Solution Approach 1:
The patent uses a composite material approach by combining multiple oxide compounds (In2O3, ZnO, SnO2) in specific ratios to create a sputtering target that maintains high zinc content (50-70 atomic %) while achieving sufficient strength through the synergistic effects of the different compounds. The composite structure prevents breakage and abnormal discharge while keeping raw material costs low.
Solution Approach 2:
The patent applies parameter changes by precisely controlling the atomic ratios of In, Zn, and Sn elements, as well as controlling sintering temperature (1000-1500°C) and time parameters. These parameter optimizations enable the target to achieve both high zinc content and adequate strength by transforming the material properties through controlled sintering processes.
2Quantity of substance
If a sputtering target with high zinc content is used, then raw material cost is reduced, but abnormal discharge and nodule generation occur easily
Solution Approach 1:
The composite oxide structure comprising In2O3-ZnO-SnO2 system provides stable sputtering performance by distributing stress and heat evenly throughout the target. The specific combination of compounds prevents nodule formation and abnormal discharge while maintaining high zinc content, ensuring reliable and stable operation during the sputtering process.
Solution Approach 2:
By optimizing sintering temperature (1000-1500°C) and holding time (10-100 hours), the patent transforms the raw material mixture into a dense, stable sintered body with uniform microstructure. This parameter control ensures that the high-zinc target maintains structural integrity and stability during sputtering, preventing abnormal discharge and nodule generation.
3Strength
If high temperature sintering is applied to increase target strength, then transverse rupture strength is improved, but production time and energy consumption increase
Solution Approach 1:
The patent optimizes the sintering process by establishing specific parameter ranges: temperature (1000-1500°C) and time (10-100 hours). Within this optimized parameter space, the sintering process achieves maximum strength development efficiently. The presence of SnO2 acts as a sintering aid that promotes grain growth and densification at these controlled parameters, achieving high strength without excessive time or energy input.
Solution Approach 2:
SnO2 serves as an intermediary substance that facilitates the sintering process. It acts as a sintering aid that promotes grain boundary formation and densification at the optimized temperature-time parameters, enabling the target to achieve high strength with reduced sintering time and energy consumption compared to sintering pure oxide mixtures.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The target achieves high strength and stability, reducing the occurrence of abnormal discharge and nodule generation, enabling efficient and uniform film formation in sputtering processes.
Implementation Method 1
a sputtering target comprising an oxide sintered body... formed through a method involving pulverization, mixing, granulation, and sintering at high temperatures
Implementation Method 2
enabling efficient and uniform film formation in sputtering processes
Data Source
AI summary
A sputtering target comprising an oxide sintered body that includes an indium element, a tin element and a zinc element, wherein the oxide sintered body includes one or more selected from a hexagonal layered compound represented by In2O3(ZnO)m, a hexagonal layered compound represented by InXO3(ZnO)n, a rutile structure compound represented by SnO2 and an ilmenite structure compound represented by ZnSnO3, and a spinel structure compound represented by Zn2SnO4, in the formulas, X is a metal element that can form a hexagonal layered compound together with an indium element and a zinc element, m is an integer of 1 or more and n is an integer of 1 or more, and an agglomerate of the spinel structure compound is 5% or less of the entire sintered body.