Zoned Electrostatic Chuck Heating for Aluminum Film Morphology
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Solution Overview
Problem
AC bias during aluminum film deposition increases substrate temperature, leading to film morphology degradation and electrostatic chuck contamination, which affects heat transfer efficiency and film quality.
Innovation Solution
A system with a substrate support divided into zones, equipped with temperature sensors and heaters, controlled by a processor to independently manage power output based on target life and temperature, ensuring precise temperature control and reducing manual adjustments.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If AC bias is used during aluminum film deposition, then Al coverage on the substrate is improved, but substrate temperature increases leading to film morphology degradation
Solution Approach 1:
The substrate support is divided into multiple independently controllable heating zones, allowing different temperature profiles to be applied to different regions of the substrate. This enables maintaining optimal temperature for Al deposition in the center while managing edge temperatures separately, resolving the contradiction between achieving good Al coverage and preventing temperature-induced morphology degradation.
Solution Approach 2:
Different zones of the substrate support are equipped with independent temperature control, allowing each zone to have optimized thermal characteristics. The center zone can be maintained at a temperature that promotes good Al coverage, while edge zones can be controlled to prevent excessive temperature rise and associated film roughness issues.
2Manufacturing precision
If AC bias is applied, then film coverage is enhanced, but film surface roughness increases due to temperature rise
Solution Approach 1:
By segmenting the substrate support into multiple heating zones with independent control, the system can maintain optimal temperature for film coverage in the center region while preventing temperature-induced roughness at the edges, thus achieving both good coverage and smooth surface morphology.
Solution Approach 2:
The system dynamically adjusts temperature parameters in different zones based on real-time monitoring and target life considerations, optimizing the balance between film coverage enhancement and surface roughness control throughout the deposition process.
3Ease of operation
If outer edges of electrostatic chuck are used, then substrate support function is provided, but contamination accumulates interfering with heat transfer
Solution Approach 1:
The substrate support edges are divided into separate controllable zones with independent heating elements. This allows the system to compensate for contamination-induced heat transfer losses at the edges by providing localized heating, maintaining reliable thermal contact even as contamination accumulates over time.
Solution Approach 2:
The system proactively compensates for anticipated heat transfer degradation at the edges by adjusting heating power in advance, based on target life predictions and real-time temperature monitoring, preventing temperature excursions before they occur.
4Manufacturing precision
If manual heater adjustments are made, then temperature control can be optimized, but downtime and preventive maintenance increase
Solution Approach 1:
The system implements real-time temperature monitoring with feedback control that automatically adjusts heater power based on measured temperatures and target life predictions. This eliminates the need for manual adjustments and preventive maintenance interventions, maintaining optimal temperature control while minimizing downtime.
Solution Approach 2:
The temperature control system is self-regulating, using sensors and controllers to automatically maintain optimal temperatures without human intervention. The system monitors its own performance and makes necessary adjustments, freeing operators from manual heater adjustments and reducing preventive maintenance requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces AC bias-induced surface roughness and contamination, maintaining optimal substrate temperature and film quality by automatically adjusting heater power outputs, minimizing downtime and preventive maintenance.
Implementation Method 1
a sputtering target disposed in the process chamber opposite the support surface
Implementation Method 2
PVD deposition
Implementation Method 3
a plurality of heaters, each heater corresponding to one zone of the plurality of zones
Data Source
AI summary
Methods and apparatus for controlling substrate temperature, comprising: monitoring a temperature in each zone of a plurality of zones of a substrate support, the substrate support having a support surface for supporting a substrate, wherein the support surface is opposed to a sputtering target for depositing material onto the substrate; depositing material from the sputtering target on a substrate; and independently controlling a plurality of heaters in the substrate support, each heater corresponding to one zone of the plurality of zones, wherein each heater is controlled based on a target life and the temperature in each zone.