Zwitterionic Acid Generator for Fine Pattern Scum Control
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Solution Overview
Problem
Conventional actinic ray-sensitive or radiation-sensitive resin compositions face challenges in forming fine patterns with line widths or space widths of 50 nm or less, particularly due to the occurrence of scum, which affects the quality and stability of the patterns.
Innovation Solution
The development of an actinic ray-sensitive or radiation-sensitive resin composition that includes a compound generating acid upon irradiation with an ionic and zwitterionic structure, featuring at least two anionic groups and one cationic group linked via covalent bonding, which helps in controlling acid diffusion and preventing scum formation during pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional actinic ray-sensitive or radiation-sensitive resin compositions are used, then high sensitivity is obtained, but scum occurs in fine patterns
Solution Approach 1:
The patent changes the chemical structure parameters of the acid generator by introducing ionic and zwitterionic structures with specific anionic and cationic groups. This structural parameter change modifies the acid generation characteristics to reduce scum formation while maintaining sensitivity for fine pattern formation
Solution Approach 2:
The patent uses a composite approach by combining compounds with ionic structures and zwitterionic structures in the resin composition. This composite material strategy integrates multiple functional characteristics to achieve both high sensitivity and reduced scum occurrence in fine patterns
2Reliability
If conventional resin compositions are used for fine pattern formation, then sensitivity is maintained, but preservation stability deteriorates
Solution Approach 1:
The patent modifies the chemical parameters of the acid generator by incorporating ionic and zwitterionic structures, which changes the stability characteristics of the resin composition while preserving its sensitivity for fine pattern formation
Solution Approach 2:
The ionic and zwitterionic structures act as intermediary components that mediate between the sensitivity requirement and the stability requirement, enabling both high sensitivity and good preservation stability to coexist in the resin composition
3Reliability
If acid diffusion is not controlled, then sensitivity is maintained, but scum formation increases
Solution Approach 1:
The ionic and zwitterionic structures serve as intermediary mechanisms that control acid diffusion by interacting with generated acid molecules, thereby reducing scum formation while maintaining the sensitivity needed for fine pattern formation
Solution Approach 2:
The patent changes the diffusion parameters of acid by introducing ionic and zwitterionic structures that modify acid mobility and distribution, reducing scum formation while preserving sensitivity for fine pattern formation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resin composition achieves high preservation stability and allows for the formation of precise fine patterns with reduced scum occurrence, enhancing the overall pattern quality and stability.
Implementation Method 1
a compound (I) that generates an acid upon irradiation with actinic rays or radiation
Data Source
AI summary
An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (I) that generates an acid upon irradiation with actinic rays or radiation and has an ionic structure and a zwitterionic structure. A pattern forming method contains forming an actinic ray-sensitive or radiation-sensitive film on a substrate using the actinic ray-sensitive or radiation-sensitive resin composition, exposing the actinic ray-sensitive or radiation-sensitive film to light; and developing the exposed actinic ray-sensitive or radiation-sensitive film with a developer.