Substrate Position Detection Without Algorithm Redesign
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Summary
Problems
Existing methods for determining the position of wafers or masks in semiconductor and display device processing require costly redesign of image analysis algorithms whenever the size or shape of the wafer or mask changes, making them inefficient for modifications in substrate or surrounding structure form.
Innovation solutions
A substrate treating apparatus and method that uses a support unit, first and second light sources, and an image analysis unit to detect the position of a substrate by analyzing images of line light sources irradiated onto the substrate and a ring member, allowing for precise positioning without modifying the image analysis algorithm, even if the substrate or structure form changes.
TRIZ Analysis
Specific contradictions:
General conflict description:
Principle concept:
If image analysis algorithm is redesigned to accommodate changes in substrate size or shape, then measurement precision is improved, but device complexity and cost increase
Why choose this principle:
The patent uses a reference object (ring member) with a known geometric pattern that serves as a template for position detection. Instead of redesigning algorithms for each substrate type, the system captures an image of the reference object and compares it against a pre-stored reference image, eliminating the need for complex algorithm redesign while maintaining high measurement precision
Principle concept:
If image analysis algorithm is redesigned to accommodate changes in substrate size or shape, then measurement precision is improved, but device complexity and cost increase
Why choose this principle:
The system changes the detection parameter from substrate-specific features to reference object features. By detecting the position of the ring member (which has fixed geometric characteristics) rather than directly detecting substrate features, the system maintains consistent detection parameters regardless of substrate variations, thus avoiding algorithm complexity increases
Application Domain
Data Source
AI summary:
A substrate treating apparatus and method that uses a support unit, first and second light sources, and an image analysis unit to detect the position of a substrate by analyzing images of line light sources irradiated onto the substrate and a ring member, allowing for precise positioning without modifying the image analysis algorithm, even if the substrate or structure form changes.
Abstract
Embodiments of the inventive concept provide a substrate treating apparatus and a substrate treating method for allowing a position of a substrate to be known with only an analysis of an image with respect to a light source irradiated to a surrounding of the substrate. The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to seat a substrate; a first light irradiation unit configured to irradiate a first light source to the substrate; an image acquisition unit configured to acquire an image information with respect to the first light source irradiated to the substrate; and an image analysis unit configured to detect a position of the substrate by inputting the image information and analyzing the first light source irradiated to the substrate within the image information which is input.