Beam control optimization method for low-energy large-beam ion implanter

By real-time monitoring and quantitative evaluation of beam parameters, and optimization of beam position adjustment, the control lag problem of low-energy high-current ion implanters under complex operating conditions has been solved, improving the adaptability of beam control and equipment stability.

CN120933144AInactive Publication Date: 2025-11-11WUXI CHENGCHENG ELECTRONICS TECH CO LTD
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Patent Information

Application Number
CN202511083366.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-08-04
Publication Date
2025-11-11
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

Existing beam control methods for low-energy high-current ion implanters are inadequate to cope with dynamic changes under complex operating conditions, leading to beam position deviations that affect the uniformity of target doping and equipment stability. Traditional control methods also have limitations such as lag and independent parameter adjustment.

Method used

Beam parameters are collected in real time by a sensor system, state characterization indicators are generated, comparative analysis is performed, location datasets are collected, impact assessment values ​​are calculated, time variation trend quantities and mode similarity quantities are extracted, adjustment factors are obtained, and beam position adjustment is optimized.

Benefits of technology

It enables real-time monitoring and quantitative evaluation of beam status, reduces system disturbances, improves the adaptability and accuracy of beam control, maintains the uniformity of beam spatial distribution, and extends equipment operating time.

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Abstract

The invention relates to the technical field of ion implantation, and discloses a beam control optimization method for a low-energy large-beam ion implanter. According to the method, beam current and energy monitoring values are continuously collected through a sensor system, and beam state characterization indexes are generated through real-time processing; comparing the index with a preset range, and triggering an abnormal signal when the index exceeds the range; in an abnormal state, a beam position data set is collected in a fixed period, a position influence evaluation value is calculated, and if the evaluation value reaches or exceeds a threshold value, the state is marked as a high influence state; in a high influence state, extracting a time change trend quantity and a mode similarity quantity of a beam parameter, and calculating a correlation strength coefficient; and obtaining an adjustment factor according to the high influence state, multiplying the current beam current reference value by the adjustment factor to obtain an optimized beam position value, and executing position adjustment. The method achieves the dynamic monitoring and precise adjustment of the beam state, and improves the adaptability and stability of beam control.
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