Pulse electric field processing equipment
The pulsed electric field processing apparatus addresses temperature control inaccuracies by using a temperature calculation unit and power supply control, enhancing processing quality through precise temperature management.
JP7734840B2Active Publication Date: 2025-09-05MITSUBISHI ELECTRIC CORP
2 Cites 0 Cited by
Patent Information
- Application Number
- JP2024527989
- Authority / Receiving Office
- JP · JP
- Patent Type
- Patents
- Current Assignee / Owner
- Filing Date
- 2022-06-15
- Publication Date
- 2025-09-05
- Estimated Expiration
- 2042-06-15
AI Technical Summary
Technical Problem
Existing pulse electric field processing technologies fail to accurately control the temperature of the processing object, leading to a decrease in sterilization quality due to resistivity differences between measured and actual values.
Method used
A pulsed electric field processing apparatus that includes a temperature calculation unit to determine the processing temperature based on resistance values and a power supply control unit to adjust the pulsed power supply based on this temperature, ensuring accurate temperature control.
Benefits of technology
Accurate temperature control improves the processing quality of the object by maintaining it within optimal limits, preventing issues like flavor loss and nutrient degradation.
✦ Generated by Eureka AI based on patent content.
Abstract
This pulsed electric field processing apparatus comprises: a pulsed power supply which generates pulsed voltage; a pair of electrodes which, upon application of the pulsed voltage thereto, generates a pulsed electric field; a processing chamber which is disposed between said electrodes and in which the pulsed electric field is generated in a space where a liquid processing object flows; a temperature calculation unit (42) which calculates a processing temperature which is the temperature of the processing object within the processing chamber, on the basis of a preset calibration value and a resistance value acquired from the pulsed voltage and pulsed current that flows through the processing object within the processing chamber when the pulsed voltage is applied; and a power supply control unit (41) which controls the pulsed power supply on the basis of the processing temperature and a preset target temperature.
Need to check novelty before this filing date? Find Prior Art