Ion implantation wafer carrier device
By designing an ion implantation slide device including a base, a rotary gimbal, a slide base plate and a sliding fixture, the problems of high cost and unstable motion control of the ion implanter carrier system in the prior art are solved, and low-cost, multi-angle implantation and slide stability are achieved.
CN111128665BActive Publication Date: 2025-03-25BEIJING ZHONGKEXIN ELECTRONICS EQUIP
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Patent Information
- Application Number
- CN201811309621.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2018-10-31
- Publication Date
- 2025-03-25
- Estimated Expiration
- 2038-10-31
AI Technical Summary
Technical Problem
The existing ion implanter carrier system has high cost, unstable motion control, and few menus of injection process, making it difficult to meet the needs of low-cost and multi-angle injection.
Method used
An ion implantation carrier device is designed, including a base, a rotating gimbal, a slide base plate and a sliding fixture, which realizes any angle injection between 0° and 90°. It adopts mechanical clamping and water-cooling structures to support fully automatic loading and unloading of silicon wafers.
Benefits of technology
Low cost, high stability and multi-angle injection are achieved, the slide base plate can rotate continuously, and the silicon wafer clamping is stable, avoiding the high cost and instability of the electrostatic suction cup.
✦ Generated by Eureka AI based on patent content.
Abstract
The present invention discloses an ion implantation wafer carrier, comprising: a base, a rotating platform, a wafer carrier substrate, a sliding fixture, etc. The base can provide support for the rotating platform and the wafer carrier substrate, and can provide angle changes between the wafer carrier substrate and the injection axis to meet the angle requirements of the implantation process; the rotating platform can provide angle changes and rotational movement around the center of the wafer carrier substrate; the wafer carrier substrate can load silicon wafers, and the wafer carrier substrate is designed with water cooling to meet the cooling requirements during ion implantation; the sliding fixture can achieve silicon wafer clamping of specified specifications, and can achieve firm clamping of silicon wafers without damaging the silicon wafers during the movement of the wafer carrier. The present invention relates to an ion implantation device, and belongs to the field of semiconductor manufacturing.
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