Mold, manufacturing method, film forming method, article manufacturing method, and imprint apparatus
By designing a mold composed of high and low elastic modulus materials and forming a transfer pattern on its surface, the problem of foreign matter on the substrate cannot be completely transferred is solved, and a high-precision and durable imprinting effect is achieved.
Patent Information
- Application Number
- CN202411282441.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2023-09-15
- Filing Date
- 2024-09-13
- Publication Date
- 2025-03-18
AI Technical Summary
When manufacturing devices such as optical components, foreign objects on the substrate cause the pattern of the replica mold to be completely transferred, and vigorous printing may damage the mold.
A mold is designed which consists of a high elastic modulus material and a low elastic modulus material. By forming a low elastic modulus portion on the convex portion of the high elastic modulus portion of the mold and forming a transfer pattern on its surface, a film of a curable composition is formed between the mold and the substrate by an imprinting method.
While forming fine patterns on the substrate, the pressure requirement for the replica mold is reduced, the non-contact area around foreign matter is reduced, and the transfer accuracy and durability of the mold is improved.