VSP reflection wave coverage times calculation method and device, storage medium and equipment
By creating a bin grid and mapping the reflection point positions in the VSP acquisition design, the problem of low efficiency in calculating the reflection wave coverage number in the existing technology is solved, and high-precision and efficient coverage number calculation is achieved.
Patent Information
- Application Number
- CN202311359903.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-10-19
- Publication Date
- 2025-10-17
- Estimated Expiration
- 2043-10-19
AI Technical Summary
In the existing VSP acquisition design, the calculation efficiency of the reflection wave coverage times is low and the accuracy is not high. Especially in large models or cases with multiple shot checkpoints, the ray tracing method has low calculation efficiency.
By creating a bin grid, the reflection point position of each shot check point in each layer is calculated and mapped to the bin grid, and the coverage number of the reflected wave is directly calculated using an analytical formula instead of a step-by-step approximation of the ray path.
It achieves high-precision calculation of the number of reflection wave coverages and improves computational efficiency, which is more than 10 times faster than the ray tracing method.