Quartz glass material and preparation method thereof
Through a high solids silica sol system and gradient damping calcining process, the large shrinkage and cracking problems of the sol-gel method are solved, and a high transmittance and low cost fine structure preparation is achieved.
CN120573931APending Publication Date: 2025-09-02CDGM OPTICAL GLASS
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Patent Information
- Application Number
- CN202510681984.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-05-26
- Publication Date
- 2025-09-02
AI Technical Summary
Technical Problem
The existing sol-gel method for preparing quartz glass is prone to high shrinkage and structural defects, especially the cracking problem during material glue removal is difficult to effectively solve.
Method used
Quartz glass materials are prepared by controlling the ratio of silica nanopowder to water, adding an appropriate amount of dispersant, water-soluble monofunctional polymer monomer and initiator, combined with gradient humidity reduction and calcination processes.
Benefits of technology
It effectively avoids cracking and structural deformation of quartz glass, realizes one-time molding of fine surface structures, reduces processing costs, and improves the transmittance and purity of quartz glass.
✦ Generated by Eureka AI based on patent content.
Abstract
The invention discloses a quartz glass material and a preparation method thereof, and relates to the technical field of quartz glass preparation. A preparation method of a quartz glass material comprises the following steps: mixing water, silica nano-powder, a dispersant, a water-soluble monofunctional polymer monomer and an initiator in proportion, and adjusting pH to obtain silica sol; wherein the volume ratio of the silicon dioxide nano powder to the water is (0.4-0.9): 1; carrying out injection molding on the silicon dioxide sol, carrying out heating gelation, and demolding to obtain wet gel; at room temperature, humidity is reduced in a gradient mode to evaporate moisture of the wet gel, and silicon dioxide xerogel is obtained; calcining the silica xerogel at 550-800 DEG C, and discharging the silica xerogel to obtain a silica powder blank; and sintering the silicon dioxide powder blank at 1250-1400 DEG C to obtain the quartz glass material. Through a high-solid-content sol and low-organic-matter-content silicon dioxide sol system, the size shrinkage rate of a sample is reduced, and the problems of air holes, crystallization, deformation and cracking in the preparation process are avoided.
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